EUV resist underlayer film-forming composition

An EUV resist underlayer film-forming composition comprising:

• an organic solvent;
• a reaction product of a compound represented by formula (1) below with a diepoxy compound:
• wherein in formula (1),
• Y1 is a C1-C10 alkylene group in which all of hydrogen atoms are substituted by fluorine atoms,
• T1 and T2 each independently denote a carboxy group,
• R1 and R2 each independently denote a C1-C10 alkyl group optionally substituted by a fluorine atom, and
• n1 and n2 each independently denote an integer of 0 to 4,
• wherein the diepoxy compound is a compound containing a heterocycle;
• and
• a crosslinking agent selected from the group consisting of
• hexamethoxymethylmelamine,
• tetramethoxymethylbenzoguanamine,
• 1,3,4,6-tetrakis(methoxymethyl)glycoluril,
• 1,3,4,6-tetrakis(butoxymethyl)glycoluril,
• 1,3,4,6-tetrakis(hydroxymethyl)glycoluril,
• 1,3-bis(hydroxymethyl)urea,
• 1,1,3,3-tetrakis(butoxymethyl)urea,
• 1,1,3,3-tetrakis(methoxymethyl)urea
• 2,4,6-tris[bis(methoxymethyl)amino]-1,3,5-triazine, and
• glycoluril derivatives represented by formula (1A):
• wherein in formula (1A), the four R1S each independently denote a methyl group or an ethyl group, and R2 and R3 each independently denote a hydrogen atom, a C1-C4 alkyl group or a phenyl group.