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US 12,736,874 B2Granted
Apparatus and process for EUV dry resist sensitization by gas phase infusion of a sensitizer
AssigneeLam Research Corporation
InventorsSivananda Krishnan Kanakasabapathy, Samantha S.H. Tan, Jengyi Yu, Younghee Lee, Alan J. Jensen, Da Li
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Abstract
The present disclosure relates to stacks having a sensitized resist film, as well as methods and apparatuses for applying such sensitized films. In particular embodiments, the sensitizer can be provided in gas form, and unreacted sensitizer precursors can be recovered after a deposition step.
Claims3
A stack comprising:
- a semiconductor substrate having a top surface;
- and
- a sensitized film disposed on the top surface of the semiconductor substrate, wherein the film comprises an Extreme Ultraviolet (EUV) resist material and an EUV sensitizer dispersed throughout the film, and wherein the EUV resist material comprises organometallic material,
- wherein the organometallic material comprises an iodo-substituted alkyl group.
1 more element
Dependencies are inferred from the claim text.