G03F 7/201
Characterised by an oblique exposure
Official title: {characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask}
G03F7/201 (Characterised by an oblique exposure) appears on 225 US grants and 244 published applications in this corpus.
Search patents in G03F- Granted patents
- 225
- Published applications
- 244
- Assignees
- 152
- Inventors
- 469
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 2 | 0 |
| 1981 | 4 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 5 | 0 |
| 1995 | 5 | 0 |
| 1996 | 0 | 0 |
| 1997 | 3 | 0 |
| 1998 | 2 | 0 |
| 1999 | 5 | 0 |
| 2000 | 5 | 0 |
| 2001 | 3 | 3 |
| 2002 | 2 | 6 |
| 2003 | 5 | 4 |
| 2004 | 4 | 8 |
| 2005 | 4 | 11 |
| 2006 | 5 | 5 |
| 2007 | 5 | 6 |
| 2008 | 6 | 4 |
| 2009 | 4 | 8 |
| 2010 | 7 | 8 |
| 2011 | 5 | 5 |
| 2012 | 8 | 5 |
| 2013 | 5 | 9 |
| 2014 | 4 | 10 |
| 2015 | 11 | 10 |
| 2016 | 9 | 15 |
| 2017 | 12 | 15 |
| 2018 | 17 | 23 |
| 2019 | 18 | 11 |
| 2020 | 15 | 12 |
| 2021 | 8 | 12 |
| 2022 | 3 | 13 |
| 2023 | 6 | 10 |
| 2024 | 8 | 16 |
| 2025 | 5 | 7 |
| 2026 | 9 | 8 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- UV lithography system and method6 Oct 2026US 12,754,480 B2The Regents of the University of California
- Exposure apparatus9 Jun 2026US 12,650,651 B2Contemporary Amperex Technology (Hong Kong) Limited
- Maintaining raw flexible plate integrity using pre-hardened flexible plate regions2 Jun 2026US 12,643,319 B2Sp Holding II Et, Inc.
- Method and system to determine an exposure time and/or intensity to be used for obtaining a desired feature of a relief structure21 Apr 2026US 12,607,939 B2Xsys Prepress NV
- Method and apparatus for exposure of flexographic printing plates using light emitting diode (LED) radiation sources3 Mar 2026US 12,566,379 B2Esko-Graphics Imaging GmbH
- Magnetic annealing of metal oxide based resists8 Oct 2026US 2026/0310086 A1APPLIED Materials.Inc.
- Uv light irradiation apparatus and mounting system1 Oct 2026US 2026/0299423 A1Shibaura Mechatronics Corporation
- Systems and methods for optimization of parameters for exposing flexographic photopolymer plates6 Aug 2026US 2026/0227701 A1Esko-Graphics Imaging GmbH
- Method and apparatus for exposure of flexographic printing plates using light emitting diode (led) radiation sources11 Jun 2026US 2026/0161088 A1Esko-Graphics Imaging GmbH
- Mask, exposure method and touch panel14 May 2026US 2026/0133482 A1Boe Technology Group Co., Ltd.
Most cited
By later US patents
- Lithography patterning with a gas phase resist422US 10,018,920 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2018
- Optically oriented three-dimensional polymer microstructures163US 7,382,959 B1HRL Laboratories, LLC · 2008
- Projection exposure method and apparatus100US 6,211,944 B1Nikon Corporation · 2001
- Method and apparatus for increasing the resolution power of projection lithography exposure system80US 5,638,211 ANikon Corporation · 1997
- Exposure method utilizing diffracted light having different orders of diffraction75US 6,233,041 B1Nikon Corporation · 2001