G03F 7/2008
Characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective
Official title: {characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used}
G03F7/2008 (Characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective) appears on 162 US grants and 167 published applications in this corpus.
Search patents in G03F- Granted patents
- 162
- Published applications
- 167
- Assignees
- 104
- Inventors
- 441
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 2 | 0 |
| 1980 | 0 | 0 |
| 1981 | 2 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 2 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 2 | 0 |
| 1991 | 0 | 0 |
| 1992 | 5 | 0 |
| 1993 | 2 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 2 | 0 |
| 2000 | 3 | 0 |
| 2001 | 2 | 0 |
| 2002 | 0 | 3 |
| 2003 | 2 | 1 |
| 2004 | 4 | 3 |
| 2005 | 1 | 1 |
| 2006 | 2 | 1 |
| 2007 | 1 | 3 |
| 2008 | 1 | 4 |
| 2009 | 1 | 3 |
| 2010 | 1 | 3 |
| 2011 | 2 | 3 |
| 2012 | 2 | 3 |
| 2013 | 3 | 6 |
| 2014 | 4 | 7 |
| 2015 | 3 | 9 |
| 2016 | 11 | 10 |
| 2017 | 9 | 14 |
| 2018 | 12 | 18 |
| 2019 | 20 | 13 |
| 2020 | 18 | 22 |
| 2021 | 9 | 7 |
| 2022 | 6 | 6 |
| 2023 | 5 | 10 |
| 2024 | 6 | 6 |
| 2025 | 7 | 8 |
| 2026 | 4 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Digital exposure system29 Sep 2026US 12,748,351 B2Korea Institute of Machinery & Materials
- Optical pulse stretcher, laser apparatus, and electronic device manufacturing method30 Jun 2026US 12,671,220 B2Gigaphoton Inc.
- Printing plate exposure method and apparatus with reduced thermal polymerization10 Feb 2026US 12,547,077 B2Esko-Graphics Imaging GmbH
- Photoresist-free photolithography, photoprocessing tools, and methods with VUV or deep-UV lamps13 Jan 2026US 12,523,933 B2The Board of Trustees of the University of Illinois
- Reflective optical element, illumination optical unit, projection exposure apparatus, and method for producing a protective layer12 Aug 2025US 12,386,263 B2Carl Zeiss SMT GmbH
- Uv light irradiation apparatus and mounting system1 Oct 2026US 2026/0299423 A1Shibaura Mechatronics Corporation
- Light source apparatus24 Sep 2026US 2026/0288009 A1Lasertec Corporation
- Method of developing photoresist8 Jan 2026US 2026/0010077 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Line narrowing module, laser device, and electronic device manufacturing method11 Sep 2025US 2025/0286339 A1Gigaphoton Inc.
- Exposure system and method of manufacturing electronic device21 Aug 2025US 2025/0264804 A1Gigaphoton Inc.
Most cited
By later US patents
- Self-aligned pattern over a reflective layer203US 5,935,763 AInternational Business Machines Corporation · 1999
- Photodeposition method for fabricating a three-dimensional, patterned polymer microstructure185US 6,200,737 B1Trustees of Tufts College · 2001
- Gradient structures interfacing microfluidics and nanofluidics, methods for fabrication and uses thereof107US 7,217,562 B2Princeton University · 2007
- Gradient structures interfacing microfluidics and nanofluidics53US 8,333,934 B2Princeton University · 2012
- Device manufacture involving lithographic processing47US 5,130,213 AAT&T Bell Laboratories · 1992