Exposure system and method of manufacturing electronic device

A method of manufacturing an electronic device, comprising

• exposing, with an exposure system, a photosensitive substrate to a pulse laser beam to manufacture the electronic device,
• the exposure system including
• an illumination optical system configured to illuminate a photomask with the pulse laser beam including a plurality of center wavelengths, and
• a projection optical system configured to illuminate the photosensitive substrate with the pulse laser beam that has passed through the photomask and to project an image of the photomask,
• a position of a first pupil that is a pupil of the illumination optical system being shifted from a reference position in a conjugate relationship with a second pupil that is a pupil of the projection optical system in a direction of reducing, by a magnification telecentric error, deviation of an imaging position due to lateral chromatic aberration on the photosensitive substrate.