G03F 7/22
Exposing sequentially with the same light pattern different positions of the same
Official title: Exposing sequentially with the same light pattern different positions of the same surface {(G03F7/70 takes precedence)}
G03F7/22 (Exposing sequentially with the same light pattern different positions of the same) appears on 68 US grants and 74 published applications in this corpus.
Search patents in G03F- Granted patents
- 68
- Published applications
- 74
- Assignees
- 45
- Inventors
- 176
- Latest grant
- 5 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 4 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 2 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 2 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 1 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 1 | 2 |
| 2007 | 2 | 1 |
| 2008 | 1 | 2 |
| 2009 | 0 | 1 |
| 2010 | 1 | 1 |
| 2011 | 2 | 2 |
| 2012 | 0 | 1 |
| 2013 | 2 | 3 |
| 2014 | 2 | 2 |
| 2015 | 2 | 3 |
| 2016 | 2 | 4 |
| 2017 | 3 | 3 |
| 2018 | 4 | 5 |
| 2019 | 5 | 7 |
| 2020 | 6 | 8 |
| 2021 | 7 | 4 |
| 2022 | 3 | 2 |
| 2023 | 2 | 7 |
| 2024 | 4 | 11 |
| 2025 | 3 | 2 |
| 2026 | 2 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Monitor structure for photoresist thickness in trench5 May 2026US 12,619,151 B2Texas Instruments Incorporated
- Mask, exposure method and touch panel10 Feb 2026US 12,547,067 B2Boe Technology Group Co., Ltd.
- Photosensitive resin composition, method for selecting photosensitive resin composition, method for producing patterned cured film, and method for producing semiconductor device2 Sep 2025US 12,405,198 B2Resonac Corporation
- Lithography system and methods2 Sep 2025US 12,405,529 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Lithography system and methods29 Apr 2025US 12,287,572 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Mask, exposure method and touch panel14 May 2026US 2026/0133482 A1Boe Technology Group Co., Ltd.
- Method and system of photolithography to form conformal circuits on curved surfaces2 Apr 2026US 2026/0093181 A1General Dynamics Mission Systems, Inc.
- Lithography system and methods27 Nov 2025US 2025/0362594 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Radiation-Sensitive Composition, Pattern Formation Method, and Photo-Degradable Base2 Jan 2025US 2025/0004375 A1Jsr Corporation
- Uv lithography system and method28 Nov 2024US 2024/0393696 A1The Regents of the University of California
Most cited
By later US patents
- Production of a volume object by lithography, having improved spatial resolution35US 9,632,420 B2Prodways · 2017
- Sequential automatic registration and imagewise exposure of a sheet substrate14US 4,522,903 AE. I. Du Pont de Nemours and Company · 1985
- Film exposure apparatus and method of exposure using the same14US 5,198,857 AUshio Denski Kabushiki Kaisha · 1993
- Multiple registration and imaging process to form a set of registered imaged elements12US 4,508,802 AE. I. Du Pont de Nemours and Company · 1985
- Method for producing an exposed substrate7US 7,241,537 B2Giesecke & Devrient GmbH · 2007