Method and system of photolithography to form conformal circuits on curved surfaces
AssigneeGeneral Dynamics Mission Systems, Inc.
InventorThomas E. Brennan
Life of this patent
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AssigneeGeneral Dynamics Mission Systems, Inc.
InventorThomas E. Brennan
Estimating the term…
A method includes receiving data of an image of a circuit pattern having multiple circuit pattern slices, and providing the data to a light projector aimed toward at least one light-sensitive material over a substrate of an object. The method also includes generating a patterned light-sensitive material, including projecting at least one temporal sequence of frames from the light projector. Each frame within a single temporal sequence has an image of a different one of the circuit pattern slices and projected so that each circuit pattern slice forms a contour line on the light-sensitive material. The method includes moving the light projector, the substrate, or both after an individual frame projection so that each contour line in the same temporal sequence is formed at a different location on the at least one light-sensitive material. The patterned light-sensitive material is used to pattern a conductive material over the substrate.
A method, comprising:
A system, comprising:
At least one non-transitory computer-readable medium having computer-executable instructions stored thereon that, when executed by a computing device, cause the computing device to operate by:
Dependencies are inferred from the claim text.