Production of a volume object by lithography, having improved spatial resolution
AssigneeProdways
InventorAndré-Luc Allanic
Life of this patent
Estimating the term…
Abstract
The present invention concerns a method for producing a volume object by lithography, comprising a projection of the projection image onto a plane to be illuminated of the layer of material, which involves: moving the mask in a movement having a component along an oblique axis forming an angle with the plane to be illuminated, and transforming a movement of the mask having a component along the oblique axis forming the angle with the plane to be illuminated into a displacement of the projection image on the plane to be illuminated along the first direction of the displacement contained in the plane to be illuminated by means of a mirror that reflects the projection image coming from the mask towards the plane to be illuminated.
Claims14
A method for manufacturing a volumetric object by lithography, including:
- a) supplying in a working volume a layer of photosensitive material arranged to harden under the influence of a radiation,
- b) creating, through a mask and a radiation source, a projection image leaving the mask,
- c) projecting the projection image onto a plane to be illuminated of the material layer,
- d) displacing the projection image in the plane to be illuminated along a first displacement direction and displacing the projection image in the plane to be illuminated along a second displacement direction different from the first direction and not superimposed on the first direction, these two displacement directions being contained within the plane to be illuminated,
- wherein to displace the projection image along the first displacement direction:
- the mask is displaced with respect to the plane to be illuminated in a movement along an oblique axis forming an angle with the plane to be illuminated, said oblique axis not being perpendicular or parallel to the plane to be illuminated,
- this movement of the mask having the component along the oblique axis forming the angle with the plane to be illuminated is transformed by displacing the projection image on the plane to be illuminated along the first displacement direction contained in the plane to be illuminated by means of a mirror which reflects toward the plane to be illuminated the projection image produced by the mask.
A device for manufacturing a volumetric object by lithography, including:
- a container arranged to accommodate, in a working volume, a layer of material,
- a mask and a radiation source arranged to create together a projection image leaving the mask,
- means to project the projection image on a plane to be illuminated into the working volume, these means of projection including means to displace the projection image in the plane to be illuminated along a first displacement direction and means for displacing the projection image in the plane to be illuminated along a second displacement direction different from the first direction and not superimposed on the first direction, wherein the means for displacing the projection image along the first displacement direction include:
- means for displacing the mask with respect to the plane to be illuminated according to a movement along an oblique axis forming an angle with the plane to be illuminated, said oblique axis not being perpendicular or parallel to the plane to be illuminated,
- a mirror arranged to reflect toward the plane to be illuminated the projection image produced by the mask and to transform the movement of the mask having the component along the oblique axis forming the angle with the plane to be illuminated into a displacement of the projection image on the plane to be illuminated along the first displacement direction contained in the plane to be illuminated.
Dependencies are inferred from the claim text.