G03F 7/2037
Exposure with x-ray radiation or corpuscular radiation, through a mask with a
Official title: {Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation}
G03F7/2037 (Exposure with x-ray radiation or corpuscular radiation, through a mask with a) appears on 439 US grants and 423 published applications in this corpus.
Search patents in G03F- Granted patents
- 439
- Published applications
- 423
- Assignees
- 171
- Inventors
- 836
- Latest grant
- 3 Mar 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 2 | 0 |
| 1978 | 0 | 0 |
| 1979 | 1 | 0 |
| 1980 | 2 | 0 |
| 1981 | 2 | 0 |
| 1982 | 6 | 0 |
| 1983 | 2 | 0 |
| 1984 | 3 | 0 |
| 1985 | 0 | 0 |
| 1986 | 2 | 0 |
| 1987 | 5 | 0 |
| 1988 | 1 | 0 |
| 1989 | 3 | 0 |
| 1990 | 3 | 0 |
| 1991 | 4 | 0 |
| 1992 | 7 | 0 |
| 1993 | 3 | 0 |
| 1994 | 8 | 0 |
| 1995 | 2 | 0 |
| 1996 | 6 | 0 |
| 1997 | 6 | 0 |
| 1998 | 2 | 0 |
| 1999 | 11 | 0 |
| 2000 | 12 | 0 |
| 2001 | 6 | 4 |
| 2002 | 10 | 11 |
| 2003 | 9 | 7 |
| 2004 | 7 | 4 |
| 2005 | 4 | 2 |
| 2006 | 0 | 3 |
| 2007 | 2 | 1 |
| 2008 | 0 | 2 |
| 2009 | 1 | 0 |
| 2010 | 2 | 4 |
| 2011 | 1 | 2 |
| 2012 | 2 | 11 |
| 2013 | 3 | 11 |
| 2014 | 14 | 23 |
| 2015 | 24 | 40 |
| 2016 | 29 | 24 |
| 2017 | 32 | 64 |
| 2018 | 37 | 44 |
| 2019 | 36 | 45 |
| 2020 | 28 | 43 |
| 2021 | 26 | 31 |
| 2022 | 31 | 7 |
| 2023 | 20 | 10 |
| 2024 | 12 | 15 |
| 2025 | 9 | 7 |
| 2026 | 1 | 8 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Multiple patterning with organometallic photopatternable layers with intermediate freeze steps3 Mar 2026US 12,566,377 B2Inpria Corporation
- Positive resist composition and pattern forming process16 Dec 2025US 12,498,637 B2Shin-Etsu Chemical Co., Ltd.
- Process and apparatus for feeding a flexographic printing plate processor28 Oct 2025US 12,455,506 B2Esko-Graphics Imaging GmbH
- Semiconductor device23 Sep 2025US 12,423,498 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method for forming resist pattern and radiation-sensitive resin composition29 Jul 2025US 12,372,869 B2Jsr Corporation
- Resist composition and patterning process8 Oct 2026US 2026/0310074 A1Shin-Etsu Chemical Co., Ltd.
- Data processing method, charged particle beam writing method, charged particle beam writing apparatus, and computer readable recording medium1 Oct 2026US 2026/0299425 A1NuFlare Technology, Inc.
- Optical system including optical filter and corresponding method1 Oct 2026US 2026/0299430 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Chemically amplified positive resist composition and resist pattern forming process10 Sep 2026US 2026/0267226 A1Shin-Etsu Chemical Co., Ltd.
- Resist and Process for Dry Positive Tone Electron Beam Lithography23 Jul 2026US 2026/0211318 A1California Institute of Technology
Most cited
By later US patents
- Organometallic solution based high resolution patterning compositions475US 9,310,684 B2Inpria Corporation · 2016
- Lithography patterning with a gas phase resist422US 10,018,920 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2018
- X-ray reduction projection exposure system of reflection type112US 5,153,898 ACanon Kabushiki Kaisha · 1992
- Ringfield lithography107US 5,315,629 AAT&T Bell Laboratories · 1994
- Alignment method for multi-level deep x-ray lithography utilizing alignment holes and posts92US 5,866,281 AWisconsin Alumni Research Foundation · 1999