Multiple patterning with organometallic photopatternable layers with intermediate freeze steps

A structure comprising:

• a substrate;
• an unpatterned hardmask coating on the substrate;
• a first patterned layer comprising a first pattern of a first tin oxide based material over the hardmask coating wherein gaps in the first pattern do not cover the hardmask coating;
• and
• a second patterned layer comprising a second pattern of a second tin oxide based material, wherein the second patterned layer is over the hardmask coating with the first pattern, wherein portions of the second tin oxide based material overlap with portions of the first tin oxide based material, wherein the second pattern is distinct from the first pattern and wherein the second pattern comprises open regions which extend to the hardmask coating, with the proviso that the second tin oxide based material is insoluble in aqueous base, and wherein the first pattern comprises a regular pattern of repeating structural elements with cuts in the first tin oxide based material of the regular pattern that correspond to the open regions in the second pattern such that the open regions extend through the second tin oxide based material and the first tin oxide based material to the hard mask coating.