G03F 7/2039
X-ray radiation
Official title: {X-ray radiation}
G03F7/2039 (X-ray radiation) appears on 135 US grants and 86 published applications in this corpus.
Search patents in G03F- Granted patents
- 135
- Published applications
- 86
- Assignees
- 80
- Inventors
- 351
- Latest grant
- 31 Dec 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 2 | 0 |
| 1981 | 1 | 0 |
| 1982 | 4 | 0 |
| 1983 | 1 | 0 |
| 1984 | 2 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 4 | 0 |
| 1988 | 0 | 0 |
| 1989 | 3 | 0 |
| 1990 | 3 | 0 |
| 1991 | 4 | 0 |
| 1992 | 6 | 0 |
| 1993 | 2 | 0 |
| 1994 | 6 | 0 |
| 1995 | 2 | 0 |
| 1996 | 6 | 0 |
| 1997 | 5 | 0 |
| 1998 | 0 | 0 |
| 1999 | 5 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 2 |
| 2002 | 5 | 6 |
| 2003 | 5 | 4 |
| 2004 | 4 | 3 |
| 2005 | 3 | 2 |
| 2006 | 0 | 2 |
| 2007 | 2 | 1 |
| 2008 | 0 | 1 |
| 2009 | 1 | 0 |
| 2010 | 2 | 1 |
| 2011 | 0 | 2 |
| 2012 | 1 | 6 |
| 2013 | 0 | 4 |
| 2014 | 4 | 7 |
| 2015 | 11 | 6 |
| 2016 | 4 | 4 |
| 2017 | 8 | 8 |
| 2018 | 5 | 7 |
| 2019 | 3 | 5 |
| 2020 | 5 | 3 |
| 2021 | 4 | 6 |
| 2022 | 4 | 1 |
| 2023 | 0 | 0 |
| 2024 | 3 | 3 |
| 2025 | 0 | 1 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Resist compositions and semiconductor fabrication methods using the same31 Dec 2024US 12,181,799 B2Samsung Electronics Co., Ltd.
- Quantum-limited extreme ultraviolet coherent diffraction imaging10 Sep 2024US 12,085,520 B2Regents of the Univ of Colorado
- Sulfonium salt, photoacid generator, curable composition, and resist composition12 Mar 2024US 11,926,581 B2San-Apro Ltd.
- Resist composition, method for forming resist pattern, and polyphenol compound used therein25 Oct 2022US 11,480,877 B2Mitsubishi Gas Chemical Company, Inc.
- Method for producing a scattered beam collimator, scattered beam collimator and x-ray device with scattered beam collimator13 Sep 2022US 11,443,867 B2Siemens Healthcare GmbH
- Optical system including optical filter and corresponding method1 Oct 2026US 2026/0299430 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Polymer, resist composition including the same, and method of forming pattern by using the resist composition2 Jan 2025US 2025/0004370 A1Samsung Electronics Co., Ltd.
- Active light ray sensitive or radioactive ray sensitive resin composition, resist film, pattern-forming method, and method for manufacturing electronic device19 Dec 2024US 2024/0419072 A1FUJIFILM Corporation
- Optical beam sensor with center transmissive cut-out15 Aug 2024US 2024/0271996 A1KLA Corporation
- Semiconductor device manufacturing method, x-ray diffraction device and semiconductor pattern transfer system11 Jul 2024US 2024/0231234 A1Mitsubishi Electric Corporation
Most cited
By later US patents
- Lithography patterning with a gas phase resist422US 10,018,920 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2018
- X-ray reduction projection exposure system of reflection type112US 5,153,898 ACanon Kabushiki Kaisha · 1992
- Ringfield lithography107US 5,315,629 AAT&T Bell Laboratories · 1994
- Alignment method for multi-level deep x-ray lithography utilizing alignment holes and posts92US 5,866,281 AWisconsin Alumni Research Foundation · 1999
- X-ray pattern masking by a reflective reduction projection optical system72US 5,222,112 AHitachi, Ltd. · 1993