X-ray pattern masking by a reflective reduction projection optical system

A fine pattern printing method for performing reduction projection of a pattern drawn on a mask onto a substrate via an imaging optical system by using a source emitting an X-ray or vacuum ultraviolet beam, said fine pattern printing method comprising the steps of:

• providing said beam, at at least one point on an optical path between said source and said substrate, a reflecting mirror for reflecting said beam so as to bend said beam by approximately 90.degree.;
• and
• selecting the reflecting mirror so that the oscillation plane of a strongest electric field of said beam is not parallel to a plane including an incident beam and a reflected beam of said reflecting mirror.

In an apparatus for printing fine patterns on a substrate including a source for emitting an X-ray or vacuum ultraviolet beam, means for applying said beam onto a mask, imaging optical means for focusing said beam from said mark onto the substrate, and positioning means for moving said substrate to desired positions, the improvement comprising:

• a reflecting mirror disposed at at least one point on a beam path between said source and said to reflect said beam so as to bend said beam by approximately 90.degree.;
• and
• the oscillation plane of a strongest electric field of said beam being not parallel to a plane including an incident beam and a reflected beam of said reflecting mirror.

A fine pattern printing method for performing reduction projection of a pattern drawn on a mask onto a substrate via an imaging optical system by illuminating said mask with an X-ray or vacuum ultraviolet beam, said fine pattern printing method comprising the step of:

• projecting the beam onto the substrate with a 0th order diffraction image and a higher than 0th order diffraction image;
• and
• weakening the higher than 0th order diffraction image more than the oth order diffraction image.

In an X-ray projection exposure apparatus including a source for emitting an X-ray or vacuum ultraviolet beam, imaging optical means for performing reduction projection of a pattern drawn on a mask onto a substrate, and positioning means for positioning said substrate in a predetermined position, the improvement comprising:

• said imaging optical means including plural reflecting mirrors;
• and
• optical means for lowering the intensity of a peripheral part of said beam that is projected onto the substrate a greater amount than a central part of said beam that is projected onto the substrate, said optical means being disposed nearly in an entrance pupil position of said imaging optical system.