G03F 7/213
Exposing with the same light pattern different positions of the same surface
Official title: Exposing with the same light pattern different positions of the same surface at the same time {(G03F7/70 takes precedence)}
G03F7/213 (Exposing with the same light pattern different positions of the same surface) appears on 14 US grants and 25 published applications in this corpus.
Search patents in G03F- Granted patents
- 14
- Published applications
- 25
- Assignees
- 21
- Inventors
- 66
- Latest grant
- 1 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2006 | 0 | 1 |
| 2007 | 0 | 0 |
| 2008 | 0 | 1 |
| 2009 | 1 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 1 |
| 2012 | 0 | 1 |
| 2013 | 1 | 1 |
| 2014 | 0 | 3 |
| 2015 | 0 | 0 |
| 2016 | 2 | 2 |
| 2017 | 1 | 0 |
| 2018 | 1 | 2 |
| 2019 | 0 | 2 |
| 2020 | 3 | 3 |
| 2021 | 3 | 1 |
| 2022 | 1 | 1 |
| 2023 | 0 | 2 |
| 2024 | 0 | 1 |
| 2025 | 0 | 1 |
| 2026 | 1 | 2 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Method for adjusting local thickness of photoresist1 Sep 2026US 12,724,348 B2Shanghai Huali Integrated Circuit Corporation
- Optical patterning systems and methods20 Sep 2022US 11,448,965 B2Board of Regents, The University of Texas System
- Adapting the duration of exposure slots in multi-beam writers24 Aug 2021US 11,099,482 B2IMS Nanofabrication GmbH
- Large area high resolution feature reduction lithography technique22 Jun 2021US 11,042,098 B2APPLIED Materials.Inc.
- Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method1 Jun 2021US 11,022,900 B2ASML Netherlands B. V.
- Drawing method and drawing device1 Oct 2026US 2026/0299426 A1SCREEN Holdings Co., Ltd.
- Greyscale lithography for substrate topography correction2 Apr 2026US 2026/0093184 A1APPLIED Materials.Inc.
- Lithography processes for dual damascene structures25 Dec 2025US 2025/0390026 A1APPLIED Materials.Inc.
- Method for adjusting local thickness of photoresist18 Jan 2024US 2024/0019783 A1Shanghai Huali Integrated Circuit Corporation
- Exposure apparatus20 Apr 2023US 2023/0120789 A1PlayNitride Display Co., Ltd.
Most cited
By later US patents
- Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method5US 9,958,791 B2ASML Netherlands B. V. · 2018
- Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method3US 10,761,432 B2ASML Netherlands B. V. · 2020
- Adapting the duration of exposure slots in multi-beam writers3US 11,099,482 B2IMS Nanofabrication GmbH · 2021
- Processing apparatus for processing a flexographic plate, a method and a computer program product2US 9,463,595 B2Xeikon Prepress N.V. · 2016
- Mask for deposition and method of manufacturing the same1US 10,665,785 B2Samsung Display Co., Ltd. · 2020