Optical patterning systems and methods

A system for patterning a two-dimensional atomic layer material, the system comprising:

• an optothermal substrate in thermal contact with a two-dimensional atomic layer material, wherein the optothermal substrate comprises a plasmonic substrate having a plasmon resonance energy;
• and
• a light source configured to illuminate the optothermal substrate at a first location with electromagnetic radiation, wherein the electromagnetic radiation has a power density of from 0.1 mW/μm2 to 5 mW/μm2 and the electromagnetic radiation comprises a wavelength that overlaps with at least a portion of the plasmon resonance energy of the plasmonic substrate, such that the optothermal substrate converts at least a portion of the electromagnetic radiation into thermal energy via plasmon-enhanced photothermal effects;
• thereby:
• generating an ablation region at a location of the two-dimensional atomic layer material proximate to the first location of the optothermal substrate via plasmon-enhanced photothermal effects, wherein at least a portion of the ablation region has a temperature sufficient to ablate at least a portion of the two-dimensional atomic layer material within the ablation region;
• and
• ablating at least a portion of the two-dimensional atomic layer material within the ablation region proximate to the first location of the optothermal substrate,
• thereby patterning the two-dimensional atomic layer material.