G03F 7/2022
Multi-step exposure
Official title: {Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure}
G03F7/2022 (Multi-step exposure) appears on 1,628 US grants and 1,473 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,628
- Published applications
- 1,473
- Assignees
- 603
- Inventors
- 3,498
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 2 | 0 |
| 1978 | 9 | 0 |
| 1979 | 5 | 0 |
| 1980 | 3 | 0 |
| 1981 | 9 | 0 |
| 1982 | 5 | 0 |
| 1983 | 9 | 0 |
| 1984 | 10 | 0 |
| 1985 | 7 | 0 |
| 1986 | 17 | 0 |
| 1987 | 7 | 0 |
| 1988 | 6 | 0 |
| 1989 | 15 | 0 |
| 1990 | 18 | 0 |
| 1991 | 11 | 0 |
| 1992 | 16 | 0 |
| 1993 | 16 | 0 |
| 1994 | 32 | 0 |
| 1995 | 23 | 0 |
| 1996 | 24 | 0 |
| 1997 | 25 | 0 |
| 1998 | 42 | 0 |
| 1999 | 55 | 0 |
| 2000 | 40 | 0 |
| 2001 | 51 | 15 |
| 2002 | 47 | 68 |
| 2003 | 59 | 50 |
| 2004 | 50 | 53 |
| 2005 | 30 | 52 |
| 2006 | 31 | 53 |
| 2007 | 21 | 41 |
| 2008 | 24 | 49 |
| 2009 | 25 | 52 |
| 2010 | 49 | 49 |
| 2011 | 35 | 48 |
| 2012 | 45 | 42 |
| 2013 | 48 | 84 |
| 2014 | 74 | 63 |
| 2015 | 72 | 84 |
| 2016 | 69 | 88 |
| 2017 | 61 | 69 |
| 2018 | 71 | 67 |
| 2019 | 51 | 61 |
| 2020 | 62 | 80 |
| 2021 | 46 | 54 |
| 2022 | 53 | 72 |
| 2023 | 43 | 51 |
| 2024 | 36 | 46 |
| 2025 | 42 | 47 |
| 2026 | 24 | 35 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Mask for stitching exposure15 Sep 2026US 12,736,869 B2Korea Advanced Institute of Science and Technology
- Lithography stitching28 Jul 2026US 12,693,597 B2APPLIED Materials.Inc.
- Conductive polymer composition, coated product, and patterning process7 Jul 2026US 12,675,047 B2Shin-Etsu Chemical Co., Ltd.
- Flow cells and methods for making the same7 Jul 2026US 12,675,048 B2Illumina, Inc.
- Coating and developing device7 Jul 2026US 12,675,054 B2ACM Research Korea CO., LTD.
- Method and apparatus for fabrication of large area 3d photonic crystals with embedded waveguides8 Oct 2026US 2026/0310072 A1UNM Rainforest Innovations
- Manufacturing method of redistribution layer8 Oct 2026US 2026/0310094 A1Shanghai AVIC Optoelectronics Co., Ltd.
- Drawing method and drawing device1 Oct 2026US 2026/0299426 A1SCREEN Holdings Co., Ltd.
- Lithographic apparatus and associated methods10 Sep 2026US 2026/0267234 A1ASML Netherlands B. V.
- Suppressing specular reflection of mask absorber and on- resolution field stitching3 Sep 2026US 2026/0259486 A1ASML Netherlands B. V.
Most cited
By later US patents
- Hardening of photoresist501US 4,548,688 AFusion Semiconductor Systems · 1985
- Phase shifting circuit manufacture method and apparatus356US 5,858,580 ANumerical Technologies, Inc. · 1999
- Method and apparatus for extending spatial frequencies in photolithography images288US 6,042,998 AUniversity of New Mexico · 2000
- Method of customizing integrated circuits by selective secondary deposition of layer interconnect material255US 5,885,749 AClear Logic, Inc. · 1999
- Pattern generator using EUV240US 6,687,041 B1Micronic Laser Systems AB · 2004