Conductive polymer composition, coated product, and patterning process

A conductive polymer composition for an antistatic film for electron beam resist writing,

• the conductive polymer composition comprising:
• (A) a polyaniline-based conductive polymer having at least one kind of a repeating unit represented by the following general formula (1);
• and
• (B) a polymer containing at least one kind of an addition salt structure represented by the following general formula (2),
• wherein R1 to R4 each independently represent a hydrogen atom, an acidic group, a hydroxy group, an alkoxy group, a carboxy group, a nitro group, a halogen atom, a linear alkyl group having 1 to 24 carbon atoms, a branched alkyl group having 3 to 24 carbon atoms, a linear hydrocarbon group having 1 to 24 carbon atoms containing a hetero atom, a branched or cyclic hydrocarbon group having 3 to 24 carbon atoms containing a hetero atom, a linear hydrocarbon group having 1 to 24 carbon atoms partially substituted with a halogen atom, or a branched or cyclic hydrocarbon group having 3 to 24 carbon atoms partially substituted with a halogen atom,
• wherein R5 and R6 each independently represent a hydrogen atom, a linear alkyl group having 1 to 10 carbon atoms, a branched or cyclic alkyl group having 3 to 10 carbon atoms, a linear hydrocarbon group having 1 to 24 carbon atoms containing a hetero atom, or a branched or cyclic hydrocarbon group having 3 to 24 carbon atoms containing a hetero atom, Xa- represents an anion, and “a” represents a valence.