G03F 7/2024
Of the already developed image
Official title: {of the already developed image}
G03F7/2024 (Of the already developed image) appears on 210 US grants and 185 published applications in this corpus.
Search patents in G03F- Granted patents
- 210
- Published applications
- 185
- Assignees
- 118
- Inventors
- 501
- Latest grant
- 30 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 1 | 0 |
| 1980 | 2 | 0 |
| 1981 | 0 | 0 |
| 1982 | 2 | 0 |
| 1983 | 2 | 0 |
| 1984 | 5 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 8 | 0 |
| 1990 | 3 | 0 |
| 1991 | 1 | 0 |
| 1992 | 3 | 0 |
| 1993 | 2 | 0 |
| 1994 | 4 | 0 |
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 2 | 0 |
| 1999 | 6 | 0 |
| 2000 | 6 | 0 |
| 2001 | 6 | 2 |
| 2002 | 7 | 5 |
| 2003 | 7 | 5 |
| 2004 | 4 | 6 |
| 2005 | 5 | 6 |
| 2006 | 2 | 7 |
| 2007 | 0 | 9 |
| 2008 | 6 | 7 |
| 2009 | 2 | 7 |
| 2010 | 6 | 10 |
| 2011 | 6 | 10 |
| 2012 | 6 | 4 |
| 2013 | 11 | 10 |
| 2014 | 11 | 11 |
| 2015 | 14 | 17 |
| 2016 | 12 | 9 |
| 2017 | 8 | 8 |
| 2018 | 6 | 8 |
| 2019 | 7 | 8 |
| 2020 | 8 | 11 |
| 2021 | 5 | 4 |
| 2022 | 4 | 10 |
| 2023 | 5 | 5 |
| 2024 | 0 | 1 |
| 2025 | 6 | 3 |
| 2026 | 2 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Composition for forming silicon-containing metal hard mask and patterning process30 Jun 2026US 12,668,700 B2Shin-Etsu Chemical Co., Ltd.
- Method of manufacturing a semiconductor device27 Jan 2026US 12,538,760 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Wet-dry bilayer resist16 Dec 2025US 12,500,085 B2Tokyo Electron Limited
- Method of manufacturing cured film, photocurable resin composition, method of manufacturing laminate, and method of manufacturing semiconductor device23 Sep 2025US 12,422,750 B2FUJIFILM Corporation
- Wet-dry bilayer resist dual tone exposure10 Jun 2025US 12,327,726 B2Tokyo Electron Limited
- Lithography method9 Jul 2026US 2026/0194815 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Photomask module and photomask pattern transfer method applying the same14 May 2026US 2026/0133480 A1United Microelectronics Corp.
- Method of manufacturing a semiconductor device27 Nov 2025US 2025/0364249 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Semiconductor structure and manufacturing method thereof14 Aug 2025US 2025/0258435 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Resist composition for photolithography and method for manufacturing semiconductor devices using the same7 Aug 2025US 2025/0251661 A1Korea University Research and Business Foundation
Most cited
By later US patents
- Hardening of photoresist501US 4,548,688 AFusion Semiconductor Systems · 1985
- Multi depth substrate fabrication processes113US 6,569,607 B2Caliper Technologies Corp. · 2003
- Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method70US 8,227,183 B2FUJIFILM Corporation · 2012
- Diffraction grating-based wavelength selection unit having improved polarization dependent performance68US 6,765,724 B1Holotek Ltd. · 2004
- Flexographic printing plate process51US 5,015,556 AMinnesota Mining and Manufacturing Company · 1991