Photomask module and photomask pattern transfer method applying the same

A photomask pattern transfer method, comprising:

• providing a photomask module, comprising:
• a first photomask, comprising a main circuit pattern;
• and
• a second photomask, comprising a pad pattern, wherein the pad pattern comprises a pad body pattern portion and an extension pattern portion;
• the extension pattern portion extends outward from the pad body pattern portion;
• when the first photomask and the second photomask overlap with each other, the extension pattern portion is at least partially surrounded by the main circuit pattern;
• performing a first exposure and development process to transfer the main circuit pattern into a positive photoresist through a negative tone development (NTD) technology;
• and
• performing a second exposure and development process to transfer the pad pattern into the positive photoresist.