G03F 7/203
Comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
Official title: {comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation}
G03F7/203 (Comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation) appears on 339 US grants and 394 published applications in this corpus.
Search patents in G03F- Granted patents
- 339
- Published applications
- 394
- Assignees
- 192
- Inventors
- 874
- Latest grant
- 28 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 10 | 0 |
| 2000 | 4 | 0 |
| 2001 | 9 | 1 |
| 2002 | 10 | 19 |
| 2003 | 16 | 14 |
| 2004 | 12 | 14 |
| 2005 | 8 | 15 |
| 2006 | 8 | 17 |
| 2007 | 5 | 10 |
| 2008 | 5 | 5 |
| 2009 | 6 | 13 |
| 2010 | 13 | 9 |
| 2011 | 9 | 7 |
| 2012 | 11 | 13 |
| 2013 | 10 | 25 |
| 2014 | 18 | 12 |
| 2015 | 16 | 20 |
| 2016 | 22 | 30 |
| 2017 | 14 | 22 |
| 2018 | 26 | 17 |
| 2019 | 8 | 10 |
| 2020 | 16 | 26 |
| 2021 | 14 | 18 |
| 2022 | 15 | 30 |
| 2023 | 14 | 11 |
| 2024 | 15 | 15 |
| 2025 | 15 | 9 |
| 2026 | 8 | 12 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Lithography stitching28 Jul 2026US 12,693,597 B2APPLIED Materials.Inc.
- Multiple patterning with organometallic photopatternable layers with intermediate freeze steps3 Mar 2026US 12,566,377 B2Inpria Corporation
- Method and apparatus for exposure of flexographic printing plates using light emitting diode (LED) radiation sources3 Mar 2026US 12,566,379 B2Esko-Graphics Imaging GmbH
- Lithography using spin isolated monochromatic electromagnetic radiation3 Mar 2026US 12,566,380 B2
- Mask, exposure method and touch panel10 Feb 2026US 12,547,067 B2Boe Technology Group Co., Ltd.
- Drawing method and drawing device1 Oct 2026US 2026/0299426 A1SCREEN Holdings Co., Ltd.
- Resin Composition, Method for Producing Cured Film, Substrate with Multilayer Film, Method for Producing Substrate with Pattern, Method for Producing Patterned Cured Film, and Method for Producing Resin Composition27 Aug 2026US 2026/0250509 A1Central Glass Company, Limited
- Positive-type multilayer molecular film photoresist having molecular line structure13 Aug 2026US 2026/0235955 A1Samsung Electronics Co., Ltd.
- Resist underlayer film-forming composition13 Aug 2026US 2026/0235957 A1Nissan Chemical Corporation
- Grayscale photolithography method with improved accuracy18 Jun 2026US 2026/0169391 A1Commissariat A L' Energie Atomique Et Aux Energies Alternatives
Most cited
By later US patents
- Process for fabricating small geometry semiconductive devices including integrated components165US 4,049,944 AHughes Aircraft Company · 1977
- Mixed exposure for large die163US 11,264,357 B1Invensas Corporation · 2022
- Reticle and pattern formation method69US 5,998,068 AMatsushita Electric Industrial Co., Ltd. · 1999
- Method of linewidth monitoring for nanolithography46US 6,043,496 ALucent Technologies Inc. · 2000
- Charged beam lithography method43US 5,885,747 AKabushiki Kaisha Toshiba · 1999