US 6,043,496 A · Method of linewidth monitoring for nanolithography

Abstract

The specification describes a spatial autocorrelation technique for measuring ultrafine linewidths of the order of tens of nanometers and less. Two beams of actinic radiation are used to draw parallel lines in a resist material. Each beam is adjusted to deliver a dose below the threshold for printing a feature, but when combined the dose is sufficient to print a line feature. During exposure the separation between beams is changed in controlled spatial steps until the beams cross one another. During some of the steps at least a portion of the beams will be coincident thus producing printable features. The resist is developed to print the features where the beams are coincident. The lines are below the resolving power of an optical microscope but their presence is discernible. The width of the line is determined from the number of lines printed and the size of the spatial steps.

Claims19

Dependent claims

A method for measuring the width of a beam of actinic radiation said beam having a width w of less than 100 nm comprising the operations of:

a. exposing a first portion of a layer of radiation sensitive material with said beam of actinic radiation, thereby producing a first exposed image with an exposure dose D.sub.1,
b. exposing a second portion of said layer of radiation sensitive material with a said beam of actinic radiation, thereby producing a second exposed image with an exposure dose D.sub.2,
c. moving said beam by a predetermined distance S equal to or less than the width w of the beam,
d. exposing a third portion of said layer of radiation sensitive material with said beam, said third portion and said first portion at least partially overlapping thereby producing an overlapping region with an exposure dose of D.sub.1 +D.sub.2, the exposure in said overlapping region producing an actinic response in said radiation sensitive layer that is visibly discernible from the actinic response produced by said first and second exposed images.

1 more element

A method for measuring the width of a beam of actinic radiation said beam having a width of less than 100 nm comprising the operations of:

a. scanning a layer of resist with said beam of actinic radiation in a first scanning direction, thereby producing a first exposed line image with an exposure dose D.sub.1, said dose D.sub.1 being less than the dose required for printing a feature in said resist,
b. scanning said layer of resist with said beam of actinic radiation in a direction essentially parallel to said first scanning direction, thereby producing a second exposed line image with an exposure dose D.sub.2, said exposure dose D.sub.2 being less than the dose required for printing a feature in said resist but being sufficient when combined with dose D.sub.1 to produce a feature in said resist,
c. scanning said layer of resist with said beam of actinic radiation in a direction essentially parallel to said first scanning direction, thereby producing a third exposed line image with an exposure dose D.sub.2, said third exposed line image being spaced from said second exposed line image by a distance S equal to or less than the width of the line being measured,
c. repeating step b. to produce a series of exposed line images parallel to said first scanning direction, and wherein at least one of said series of exposed line images at least partially overlaps said first exposed line image thereby producing an exposure region having a dose D.sub.1 +D.sub.2 and sufficient to print at least one line feature in said resist,
d. developing said resist to print said at least one line feature,
e. viewing said series of exposed line images with a microscope to determine the number of line features printed.

3 more elements

Dependencies are inferred from the claim text.

Method of linewidth monitoring for nanolithography

Life of this patent

Method of linewidth monitoring for nanolithography

Life of this patent

Abstract

Claims19