Lithography using spin isolated monochromatic electromagnetic radiation

A method comprising:

• contacting for a period of time, and at a temperature, a portion of an uncured layer of a polymeric composition disposed over a substrate with a spin isolated beam of monochromatic electromagnetic radiation having a wavelength and an intensity sufficient to activate and at least partially cure the portion of the polymeric composition;
• wherein the spin isolated beam of monochromatic electromagnetic radiation consists essentially of a plurality of spin isolated photons, wherein the spin isolated photons are only observable within a plurality of first discrete ranges along a path of the spin isolated beam of monochromatic electromagnetic radiation, each of the first discrete ranges centered at a corresponding distance from a source of the spin isolated beam of monochromatic electromagnetic radiation, wherein essentially no photons are observable within a plurality of second discrete ranges located in-between each of the first discrete ranges along the path of the spin isolated beam of monochromatic electromagnetic radiation;
• wherein the spin isolated beam of monochromatic electromagnetic radiation is produced by directing a monochromatic electromagnetic radiation beam having the wavelength through one or more spin isolation filters;
• wherein the spin isolation filter comprises a double slit-single slit spin isolation filter comprising two coplanar slits disposed through a first wave barrier, and a second single slit disposed through a second wave barrier spaced away from first wave barrier along a path of the monochromatic electromagnetic radiation beam through the spin isolation filter,
• wherein each of the two coplanar slits have a slit width(S);
• wherein the two coplanar slits are separated center-on-center by a slit distance (d);
• and wherein the method includes:
• directing at least a portion of the monochromatic electromagnetic radiation beam through the two coplaner slits, and directing a portion of the monochromatic electromagnetic beam emanating from one of the two coplanar slits through the second single slit disposed through the second wave barrier oriented parallel to the first wave barrier, to form the spin isolated beam of monochromatic electromagnetic radiation emanating from the second single slit;
• wherein the second wave barrier is located a barrier distance D from the first wave barrier along the path of the beam,
• wherein D=((n/2)/d)* the wavelength;
• and
• wherein n is an odd integer divided by 2 (n/2).