G03F 7/70
Microphotolithographic exposure
Official title: {Microphotolithographic exposure; Apparatus therefor (photo-masks G03F1/00)}
G03F7/70 (Microphotolithographic exposure) appears on 25,117 US grants and 25,689 published applications in this corpus.
Search patents in G03F- Granted patents
- 25,117
- Published applications
- 25,689
- Assignees
- 2,403
- Inventors
- 27,062
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 21 | 0 |
| 1977 | 18 | 0 |
| 1978 | 15 | 0 |
| 1979 | 11 | 0 |
| 1980 | 30 | 0 |
| 1981 | 16 | 0 |
| 1982 | 21 | 0 |
| 1983 | 39 | 0 |
| 1984 | 39 | 0 |
| 1985 | 74 | 0 |
| 1986 | 60 | 0 |
| 1987 | 95 | 0 |
| 1988 | 87 | 0 |
| 1989 | 106 | 0 |
| 1990 | 96 | 0 |
| 1991 | 113 | 0 |
| 1992 | 161 | 0 |
| 1993 | 133 | 0 |
| 1994 | 195 | 0 |
| 1995 | 195 | 0 |
| 1996 | 238 | 0 |
| 1997 | 340 | 0 |
| 1998 | 453 | 0 |
| 1999 | 449 | 0 |
| 2000 | 464 | 0 |
| 2001 | 614 | 294 |
| 2002 | 640 | 892 |
| 2003 | 778 | 919 |
| 2004 | 842 | 1060 |
| 2005 | 778 | 1443 |
| 2006 | 993 | 1500 |
| 2007 | 900 | 1335 |
| 2008 | 927 | 1387 |
| 2009 | 844 | 1281 |
| 2010 | 975 | 1015 |
| 2011 | 841 | 943 |
| 2012 | 784 | 851 |
| 2013 | 870 | 813 |
| 2014 | 956 | 763 |
| 2015 | 875 | 937 |
| 2016 | 911 | 821 |
| 2017 | 914 | 775 |
| 2018 | 900 | 937 |
| 2019 | 994 | 999 |
| 2020 | 957 | 1003 |
| 2021 | 861 | 885 |
| 2022 | 758 | 1003 |
| 2023 | 717 | 1025 |
| 2024 | 685 | 992 |
| 2025 | 771 | 965 |
| 2026 | 563 | 851 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- G03F 7/70483Information management9,729
- G03F 7/708Construction of apparatus7,229
- G03F 7/70216Mask projection systems7,125
- G03F 7/70691Handling of masks or workpieces5,393
- G03F 7/70058Mask illumination systems4,463
- G03F 7/70425Imaging strategies3,181
- G03F 7/70008Production of exposure light, i.e. light sources2,386
- G03F 7/70383Direct write, i.e. pattern is written directly without the use of a618
Recent patents
- Techniques for improved critical dimension metrology6 Oct 2026US 12,754,013 B2Uchicago Argonne, LLC
- Method for electron beam-induced processing of a defect of a microlithographic photomask6 Oct 2026US 12,754,470 B2Carl Zeiss SMT GmbH
- Mask optimization for layer accounting for overlap with other layers6 Oct 2026US 12,754,471 B2D2S, Inc.
- Mask optimization for layer based on comparison of components in layer to components in other layers6 Oct 2026US 12,754,472 B2D2S, Inc.
- Mask optimization preferentially accounting for overlap regions6 Oct 2026US 12,754,473 B2D2S, Inc.
- Cooling system, a semiconductor apparatus including the same, and a method of replacing a filter using the same8 Oct 2026US 2026/0309362 A1Samsung Electronics Co., Ltd.
- System and method for 3d mask model based on huygens-fresnel principle8 Oct 2026US 2026/0310063 A1Samsung Electronics Co., Ltd.
- Method and system for training a prediction model to generate a two-dimensional-element representation of a mask pattern8 Oct 2026US 2026/0310065 A1ASML Netherlands B. V.
- Mask optimization accounting for more critical and less critical overlap regions8 Oct 2026US 2026/0310067 A1D2S, Inc.
- Method and apparatus for fabrication of large area 3d photonic crystals with embedded waveguides8 Oct 2026US 2026/0310072 A1UNM Rainforest Innovations
Most cited
By later US patents
- Cut-mask patterning process for fin-like field effect transistor (FinFET) device3,286US 9,236,267 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2016
- Apparatus for production of three-dimensional objects by stereolithography1,471US 4,575,330 AUVP, Inc. · 1986
- Photolithographic method for the manufacture of integrated circuits1,126US 4,346,164 A1982
- Immersion type projection exposure apparatus1,116US 5,610,683 ACanon Kabushiki Kaisha · 1997
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998