G03F 7/70416
2.5d lithography
Official title: {2.5D lithography}
G03F7/70416 (2.5d lithography) appears on 216 US grants and 228 published applications in this corpus.
Search patents in G03F- Granted patents
- 216
- Published applications
- 228
- Assignees
- 143
- Inventors
- 430
- Latest grant
- 10 Mar 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 5 | 0 |
| 1992 | 8 | 0 |
| 1993 | 9 | 0 |
| 1994 | 4 | 0 |
| 1995 | 1 | 0 |
| 1996 | 9 | 0 |
| 1997 | 4 | 0 |
| 1998 | 8 | 0 |
| 1999 | 2 | 0 |
| 2000 | 4 | 0 |
| 2001 | 3 | 3 |
| 2002 | 2 | 7 |
| 2003 | 7 | 7 |
| 2004 | 8 | 7 |
| 2005 | 4 | 5 |
| 2006 | 3 | 6 |
| 2007 | 4 | 6 |
| 2008 | 1 | 3 |
| 2009 | 2 | 3 |
| 2010 | 4 | 9 |
| 2011 | 4 | 2 |
| 2012 | 3 | 5 |
| 2013 | 2 | 5 |
| 2014 | 6 | 5 |
| 2015 | 6 | 6 |
| 2016 | 6 | 13 |
| 2017 | 6 | 10 |
| 2018 | 6 | 15 |
| 2019 | 6 | 15 |
| 2020 | 9 | 23 |
| 2021 | 17 | 21 |
| 2022 | 12 | 19 |
| 2023 | 15 | 6 |
| 2024 | 8 | 10 |
| 2025 | 10 | 10 |
| 2026 | 2 | 7 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Build material handling unit for a powder module for an apparatus for additively manufacturing three-dimensional objects10 Mar 2026US 12,570,041 B2Concept Laser GmbH
- Volumetric microlithography24 Feb 2026US 12,558,849 B2Photosynthetic B.V.
- Lithographic method for imprinting three-dimensional microstructures having oversized structural heights into a carrier material28 Oct 2025US 12,455,503 B2Joanneum Research Forschungsgesellschaft mbH
- Apparatus and method for generating a 3D structure30 Sep 2025US 12,427,713 B2Xsys Prepress NV
- Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder22 Jul 2025US 12,366,808 B2ASML Netherlands B. V.
- Grayscale photolithography method with improved accuracy18 Jun 2026US 2026/0169391 A1Commissariat A L' Energie Atomique Et Aux Energies Alternatives
- Grayscale lithography mask14 May 2026US 2026/0133498 A1Commissariat A L' Energie Atomique Et Aux Energies Alternatives
- Method for manufacturing semiconductor device, grayscale mask, and semiconductor device23 Apr 2026US 2026/0114070 A1Lite-On Singapore Pte. Ltd.
- Photocuring Ceramic Slurry and Components Manufactured Therefrom for Thermal Management Applications16 Apr 2026US 2026/0104640 A1II-Vi Delaware, Inc.
- Line scanning temporally focused two-photon lithography system12 Feb 2026US 2026/0044085 A1Massachusetts Institute of Technology
Most cited
By later US patents
- Apparatus for production of three-dimensional objects by stereolithography1,471US 4,575,330 AUVP, Inc. · 1986
- Method of making a three dimensional object by stereolithography472US 5,130,064 A3D Systems, Inc. · 1992
- Method of and apparatus for production of three dimensional objects by stereolithography415US 5,236,637 A3D Systems, Inc. · 1993
- Method and apparatus for production of three-dimensional objects by photosolidification277US 4,752,498 A1988
- Stereolithographic apparatus and method of use214US 5,247,180 ATexas Instruments Incorporated · 1993