US 12,558,849 B2 · Volumetric microlithography

Abstract

Systems and methods for volumetric microlithography are described, wherein the method may include receiving a data representation of a 3D target structure and determining a plurality of planes in a volume of a photosensitive medium or in a build volume, each plane of the plurality of planes associated with a respective depth of a plurality of depths in the build volume, the plurality of depths being defined along an optical axis of an exposure system. Each plane may correspond to a possible position of a focal plane of the exposure system. Preferably, the depths in the plurality of depths are mutually different. The photosensitive medium may include an activation compound for initiating a chemical reaction in the photosensitive medium, the activation compound being activatable by light of a first wavelength. In an embodiment, the photosensitive medium may further include an inhibition compound for inhibiting the chemical reaction in the photosensitive medium, the inhibition compound being activatable by light of a second wavelength, different from the first wavelength. The method may also comprise computing, based on a shape of the 3D target structure and, preferably, properties of the photosensitive medium, a sequence of exposure images, where each exposure image of the sequence of exposure images is associated with a plane of the plurality of planes in the build volume. Each exposure image may be associated with light of the first wavelength and/or light of the second wavelength. In an embodiment, the light may be intensity modulated light. The method may further comprise, for each focal plane of the plurality of planes, controlling the exposure system to position a focal plane of the exposure system at the depth in the build volume associated with the respective plane and to illuminate the build volume with the exposure image associated with the respective plane.

Claims22

Dependent claims

A method of volumetric microlithography comprising:

receiving a data representation of a 3D target structure;
determining a plurality of planes in a volume of a photosensitive medium in a build volume, each plane of the plurality of planes associated with a respective depth of a plurality of depths in the build volume, the plurality of depths being defined along an optical axis of an exposure system, each plane corresponding to a possible position of a focal plane of the exposure system, the depths in the plurality of depths being mutually different, the photosensitive medium including an activation compound for initiating a chemical reaction in the photosensitive medium, the activation compound being activatable by light of a first wavelength, and an inhibition compound for inhibiting the chemical reaction, the inhibition compound being activatable by light of a second wavelength, different from the first wavelength;
computing, based on a shape of the 3D target structure, a sequence of exposure images, each exposure image of the sequence of exposure images being associated with a plane of the plurality of planes, and each exposure image comprising light of the first wavelength and/or light of the second wavelength, wherein the computing the sequence of exposure images comprises computing the sequence of exposure images based on a model for predicting a chemical reaction rate due to the sequence of exposure images being projected into the photosensitive medium;
and
based on at least part of the plurality of planes, controlling the exposure system to position the focal plane of the exposure system at the depth in the build volume associated with the respective plane and to illuminate the build volume with the exposure image associated with the respective plane.

2 more elements

A computation module for a volumetric microlithography system comprising a computer readable storage medium having at least part of a program embodied therewith, and a processor coupled to the computer readable storage medium, wherein responsive to executing the computer readable storage code, the processor is configured to perform executable operations comprising:

receiving a data representation of a 3D target structure;
determining a plurality of planes in a volume of a photosensitive medium in a build volume, each plane of the plurality of planes associated with a respective depth of a plurality of depths in the build volume, the plurality of depths being defined along an optical axis of an exposure system, each plane corresponding to a possible position of a focal plane of the exposure system, the depths in the plurality of depths being mutually different, the photosensitive medium including an activation compound for initiating a chemical reaction in the photosensitive medium, the activation compound being activatable by light of a first wavelength, and an inhibition compound for inhibiting the chemical reaction, the inhibition compound being activatable by light of a second wavelength, different from the first wavelength;
and
computing, based on a shape of the 3D target structure and/or properties of the photosensitive medium and/or specifications of the exposure system, a sequence of exposure images, each exposure image of the sequence of exposure images being associated with a plane of the plurality of planes, and each exposure image comprising light of the first wavelength and/or light of the second wavelength, wherein the computing the sequence of exposure images comprises computing the sequence of exposure images based on a model for predicting a chemical reaction rate due to the sequence of exposure images being projected into the photosensitive medium.

1 more element

An exposure system for volumetric microlithography, comprising:

a holder for holding a build volume, the build volume comprising a photosensitive medium including an activation compound for initiating a chemical reaction in the photosensitive medium, the activation compound being activatable by light of a first wavelength, and an inhibition compound for inhibiting the chemical reaction, the inhibition compound being activatable by light of a second wavelength, different from the first wavelength;
optics configured to create a focal plane with a depth of focus that is thin compared to a thickness of the build volume in a direction parallel to an optical axis of the optics;
a first image formation module for generating an exposure image of the first wavelength in dependence of a position of the focal plane relative to the build volume;
a second image formation module for generating an illumination of the second wavelength in dependence of the position of the focal plane relative to the build volume;
and
a processor, configured for receiving information defining a sequence of exposure images of the first and/or second wavelength, each exposure image of the sequence of exposure images being associated with a depth in the build volume along an optical axis of the optics, and for each exposure image:
controlling the optics and/or the holder to position the focal plane of the optics system at the depth in the build volume associated with the respective exposure image;
and
controlling the first and/or second image formation module to illuminate the build volume with the respective exposure image.

6 more elements

Dependencies are inferred from the claim text.

Volumetric microlithography

Life of this patent

Volumetric microlithography

Life of this patent

Abstract

Claims22