G03F 7/70216
Mask projection systems
Official title: {Mask projection systems}
G03F7/70216 (Mask projection systems) appears on 7,125 US grants and 7,079 published applications in this corpus.
Search patents in G03F- Granted patents
- 7,125
- Published applications
- 7,079
- Assignees
- 843
- Inventors
- 7,704
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 6 | 0 |
| 1977 | 6 | 0 |
| 1978 | 3 | 0 |
| 1979 | 4 | 0 |
| 1980 | 4 | 0 |
| 1981 | 3 | 0 |
| 1982 | 4 | 0 |
| 1983 | 9 | 0 |
| 1984 | 8 | 0 |
| 1985 | 15 | 0 |
| 1986 | 13 | 0 |
| 1987 | 34 | 0 |
| 1988 | 17 | 0 |
| 1989 | 24 | 0 |
| 1990 | 34 | 0 |
| 1991 | 27 | 0 |
| 1992 | 45 | 0 |
| 1993 | 42 | 0 |
| 1994 | 61 | 0 |
| 1995 | 61 | 0 |
| 1996 | 79 | 0 |
| 1997 | 127 | 0 |
| 1998 | 153 | 0 |
| 1999 | 166 | 0 |
| 2000 | 149 | 0 |
| 2001 | 204 | 96 |
| 2002 | 201 | 227 |
| 2003 | 236 | 263 |
| 2004 | 213 | 280 |
| 2005 | 202 | 468 |
| 2006 | 306 | 549 |
| 2007 | 285 | 519 |
| 2008 | 316 | 520 |
| 2009 | 254 | 483 |
| 2010 | 332 | 324 |
| 2011 | 289 | 321 |
| 2012 | 268 | 287 |
| 2013 | 276 | 241 |
| 2014 | 344 | 234 |
| 2015 | 286 | 264 |
| 2016 | 309 | 241 |
| 2017 | 312 | 234 |
| 2018 | 263 | 256 |
| 2019 | 248 | 228 |
| 2020 | 201 | 180 |
| 2021 | 182 | 129 |
| 2022 | 114 | 146 |
| 2023 | 90 | 140 |
| 2024 | 97 | 147 |
| 2025 | 117 | 164 |
| 2026 | 86 | 138 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- G03F 7/70341Details of immersion lithography aspects1,993
- G03F 7/70283Mask effects on the imaging process1,438
- G03F 7/70358Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging1,163
- G03F 7/70258Projection system adjustments855
- G03F 7/70275Multiple projection paths570
- G03F 7/70225Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements524
- G03F 7/70241Optical aspects of refractive lens systems, i.e. comprising only refractive elements488
- G03F 7/70233Optical aspects of catoptric systems, i.e. comprising only reflective elements477
All 14 subgroupsShow fewer
- G03F 7/70308Optical correction elements, filters or phase plates for manipulating imaging light446
- G03F 7/70325Resolution enhancement techniques not otherwise provided for331
- G03F 7/70316Details of optical elements300
- G03F 7/7035Proximity or contact printers279
- G03F 7/7025Size or form of projection system aperture150
- G03F 7/703Non-planar pattern areas or non-planar masks125
Recent patents
- Mirror, optical system and method for operating an optical system6 Oct 2026US 12,754,483 B2Carl Zeiss SMT GmbH
- Optical system and method for a radiation source6 Oct 2026US 12,757,311 B2ASML Netherlands B. V.
- Projection lens, projection exposure apparatus and projection exposure method22 Sep 2026US 12,743,022 B2Carl Zeiss SMT GmbH
- Method of spatially aligning a patterning device and a substrate22 Sep 2026US 12,743,035 B2ASML Netherlands B. V.
- Assembly for a laser-operated light source and method of use15 Sep 2026US 12,736,884 B2ASML Netherlands B. V.
- Lithography system and methods8 Oct 2026US 2026/0310087 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Optical apparatus, exposure apparatus and exposure method8 Oct 2026US 2026/0310089 A1SCREEN Holdings Co., Ltd.
- Exposure apparatus and wiring pattern forming method8 Oct 2026US 2026/0310090 A1Nikon Corporation
- Systems and methods for combinatorial arrays using dynamic interference lithography8 Oct 2026US 2026/0310091 A1Rutgers, The State University of New Jersey
- Run to run overlay compensation in lithography sequences employing different lithography methods8 Oct 2026US 2026/0310103 A1
Most cited
By later US patents
- Photolithographic method for the manufacture of integrated circuits1,126US 4,346,164 A1982
- Immersion type projection exposure apparatus1,116US 5,610,683 ACanon Kabushiki Kaisha · 1997
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Pattern forming apparatus1,002US 4,480,910 AHitachi, Ltd. · 1984
- Apparatus for the photolithographic manufacture of integrated circuit elements958US 4,509,852 A1985