G03F 7/7035
Proximity or contact printers
Official title: {Proximity or contact printers}
G03F7/7035 (Proximity or contact printers) appears on 279 US grants and 274 published applications in this corpus.
Search patents in G03F- Granted patents
- 279
- Published applications
- 274
- Assignees
- 158
- Inventors
- 530
- Latest grant
- 9 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 3 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 4 | 0 |
| 1995 | 3 | 0 |
| 1996 | 4 | 0 |
| 1997 | 5 | 0 |
| 1998 | 5 | 0 |
| 1999 | 6 | 0 |
| 2000 | 4 | 0 |
| 2001 | 11 | 3 |
| 2002 | 5 | 10 |
| 2003 | 11 | 15 |
| 2004 | 7 | 16 |
| 2005 | 8 | 16 |
| 2006 | 16 | 21 |
| 2007 | 8 | 14 |
| 2008 | 10 | 18 |
| 2009 | 9 | 20 |
| 2010 | 17 | 12 |
| 2011 | 9 | 7 |
| 2012 | 6 | 16 |
| 2013 | 11 | 15 |
| 2014 | 14 | 5 |
| 2015 | 10 | 12 |
| 2016 | 9 | 6 |
| 2017 | 10 | 5 |
| 2018 | 9 | 10 |
| 2019 | 6 | 10 |
| 2020 | 9 | 13 |
| 2021 | 16 | 11 |
| 2022 | 7 | 5 |
| 2023 | 8 | 6 |
| 2024 | 7 | 4 |
| 2025 | 1 | 4 |
| 2026 | 2 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Exposure apparatus9 Jun 2026US 12,650,651 B2Contemporary Amperex Technology (Hong Kong) Limited
- Apparatus and method for calibrating a fluid dispenser13 Jan 2026US 12,523,934 B2Canon Kabushiki Kaisha
- Semiconductor lithography system and/or method3 Jun 2025US 12,321,100 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Imprint lithography19 Nov 2024US 12,147,162 B2ASML Netherlands B. V.
- Near-field lithography immersion system, immersion unit and interface module thereof3 Sep 2024US 12,078,937 B1The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Wafer stage lifting system and method for raising a wafer stage9 Oct 2025US 2025/0314976 A1Lids Semiconductor Technology Co., Ltd.
- Semiconductor lithography system and/or method18 Sep 2025US 2025/0291257 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Apparatus and method for calibrating a fluid dispenser12 Jun 2025US 2025/0189899 A1Canon Kabushiki Kaisha
- A method and apparatus for improving the uniformity of exposure of a periodic pattern13 Feb 2025US 2025/0053095 A1Eulitha AG
- Uv lithography system and method28 Nov 2024US 2024/0393696 A1The Regents of the University of California
Most cited
By later US patents
- Methods and devices for fabricating three-dimensional nanoscale structures336US 7,704,684 B2The Board of Trustees of the University of Illinois · 2010
- Method of fabricating Bragg gratings using a silica glass phase grating mask and mask used by same192US 5,367,588 AHer Majesty the Queen in right of Canada, as represented by the Minister of Communications · 1994
- Exposure method and exposure apparatus97US 6,171,730 B2Canon Kabushiki Kaisha · 2001
- Apparatus for aligning two objects95US 6,327,034 B12001
- Grating fabrication using electron beam lithography91US 5,413,884 AAmerican Telephone and Telegraph Company · 1995