Imprint lithography

An imprint lithography apparatus comprising:

• an imprint lithography template holder to hold an imprint lithography template;
• a substrate stage to hold a substrate;
• an actuator system configured to cause movement of the imprint lithography template holder, the substrate stage, or both;
• and
• a control system configured to control the actuator system, during release of an imprint lithography template from a substrate, to:
• separate the substrate and the imprint lithography template away from one another;
• and
• apply a rotation moment to the imprint lithography template, the substrate, or both, toward the other, such that at a radial extremity of an interface between the imprint lithography template and the substrate, there is a cumulative force acting on the substrate from the imprint lithography template to push the substrate against the substrate stage.