Methods and devices for fabricating three-dimensional nanoscale structures

A method for making a 3D structure, said method comprising the steps of:

• providing a substantially coherent beam of electromagnetic radiation;
• directing said substantially coherent beam of electromagnetic radiation onto a mask element in direct optical communication with a radiation sensitive material;
• wherein said mask element has at least one contact surface comprising a relief pattern in conformal contact with a contact surface of said radiation sensitive material, wherein said relief pattern generates a plurality of beams of electromagnetic radiation, thereby generating an optical interference pattern within said radiation sensitive material;
• wherein interactions of said electromagnetic radiation with said radiation sensitive material generates chemically modified regions of said radiation sensitive material,
• removing at least a portion of said chemically modified regions of said radiation sensitive material or removing at least a portion of said radiation sensitive material which is not chemically modified, thereby generating said 3D structure;
• wherein said relief pattern comprises an array of cylindrical posts.

A method for making a 3D structure, said method comprising the steps of:

• providing a substantially coherent beam of electromagnetic radiation;
• directing said substantially coherent beam of electromagnetic radiation onto a mask element in direct optical communication with a radiation sensitive material;
• wherein said mask element has at least one contact surface comprising a relief pattern in conformal contact with a contact surface of said radiation sensitive material, wherein said relief pattern generates a plurality of beams of electromagnetic radiation, thereby generating an optical interference pattern within said radiation sensitive material;
• wherein interactions of said electromagnetic radiation with said radiation sensitive material generates chemically modified regions of said radiation sensitive material,
• removing at least a portion of said chemically modified regions of said radiation sensitive material or removing at least a portion of said radiation sensitive material which is not chemically modified, thereby generating said 3D structure;
• wherein said relief pattern comprises an array of cylindrical posts and said cylindrical posts have diameters and heights that are independently selected from a range that is greater than or equal to 50 nm and less than or equal to 5000 nm.