Near-field lithography immersion system, immersion unit and interface module thereof

A near-field lithography immersion unit, an immersion field being formed between a mask and a substrate, wherein the near-field lithography immersion unit comprises an air curtain flow channel subunit, an immersion flow channel subunit, an immersion flow channel sealing subunit and a flow channel converging subunit which are sequentially stacked from bottom to top;

• wherein a gas flow channel is provided in the air curtain flow channel subunit, and gas is introduced through the gas flow channel;
• wherein the immersion flow channel subunit is configured to seal the gas flow channel of the air curtain flow channel subunit and is provided with a liquid injection flow channel and a liquid recycling flow channel, liquid is introduced through the liquid injection flow channel into an exposure field to form an immersion field, and the liquid is recycled through the liquid recycling flow channel, wherein the gas forms an air curtain surrounding the immersion field at a periphery of the immersion field;
• wherein the immersion flow channel sealing subunit is configured to seal the liquid injection flow channel and the liquid recycling flow channel of the immersion flow channel subunit;
• wherein the flow channel converging subunit is provided with a gas inlet, a liquid inlet and a liquid outlet respectively connected to the gas flow channel, the liquid injection flow channel and the liquid recycling flow channel;
• and
• wherein the flow channel converging subunit is configured to introduce the gas and the liquid into the immersion unit through a connection to an interface module and recycle the liquid from the immersion unit.