Run to run overlay compensation in lithography sequences employing different lithography methods

A method of lithography, the method comprising:

• performing an optical lithography step using an optical scanner to form a first pattern on an integrated circuit (IC) chip;
• determining a measured overlay error map using metrology for the first pattern formed on the IC chip;
• determining a set of feedforward k-terms from the measured overlay error map;
• transforming the set of feedforward k-terms to a set of feedforward non-k-terms;
• determining nano imprint lithography (NIL) overlay compensation using at least the set of feedforward non-k-terms;
• and
• performing an NIL step with the NIL overlay compensation using an NIL tool to form a second pattern on the IC chip.

A method of lithography, the method comprising:

• performing a nano imprint lithography (NIL) step using an NIL tool to form a first pattern on an integrated circuit (IC) chip;
• determining a measured overlay error map using metrology for the first pattern formed on the IC chip;
• determining a set of feedforward non-k-terms from the measured overlay error map, wherein the set of feedforward non-k-terms include finger actuator force settings for finger actuators of the NIL tool and micromirror settings of a digital mirror device (DMD) of the NIL tool;
• transforming the set of feedforward non-k-terms to a set of feedforward k-terms;
• determining optical lithography overlay compensation using at least the set of feedforward k-terms;
• and
• performing an optical lithography step with the optical lithography overlay compensation using an optical scanner to form a second pattern on the IC chip.