G03F 7/70308
Optical correction elements, filters or phase plates for manipulating imaging light
Official title: {Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift}
G03F7/70308 (Optical correction elements, filters or phase plates for manipulating imaging light) appears on 446 US grants and 457 published applications in this corpus.
Search patents in G03F- Granted patents
- 446
- Published applications
- 457
- Assignees
- 116
- Inventors
- 868
- Latest grant
- 19 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 3 | 0 |
| 1991 | 0 | 0 |
| 1992 | 4 | 0 |
| 1993 | 4 | 0 |
| 1994 | 5 | 0 |
| 1995 | 7 | 0 |
| 1996 | 6 | 0 |
| 1997 | 11 | 0 |
| 1998 | 6 | 0 |
| 1999 | 4 | 0 |
| 2000 | 5 | 0 |
| 2001 | 17 | 3 |
| 2002 | 6 | 15 |
| 2003 | 11 | 13 |
| 2004 | 7 | 21 |
| 2005 | 12 | 23 |
| 2006 | 18 | 22 |
| 2007 | 12 | 28 |
| 2008 | 16 | 23 |
| 2009 | 12 | 32 |
| 2010 | 12 | 24 |
| 2011 | 20 | 21 |
| 2012 | 17 | 16 |
| 2013 | 14 | 18 |
| 2014 | 22 | 27 |
| 2015 | 19 | 21 |
| 2016 | 28 | 19 |
| 2017 | 29 | 13 |
| 2018 | 22 | 22 |
| 2019 | 16 | 16 |
| 2020 | 21 | 18 |
| 2021 | 20 | 7 |
| 2022 | 4 | 16 |
| 2023 | 7 | 9 |
| 2024 | 11 | 12 |
| 2025 | 11 | 8 |
| 2026 | 3 | 10 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Imaging via zeroth order suppression19 May 2026US 12,631,970 B2ASML Netherlands B. V.
- Assembly for separating radiation in the far field19 May 2026US 12,631,974 B2ASML Netherlands B. V.
- Optical system for a lithographic projection exposure apparatus24 Mar 2026US 12,585,193 B2Carl Zeiss SMT GmbH
- Lighting optical system and exposure apparatus25 Nov 2025US 12,481,220 B2Ushio Denki Kabushiki Kaisha
- Magnification adjustable projection system using movable lens plates14 Oct 2025US 12,443,017 B2Corning Incorporated
- Optical apparatus, exposure apparatus and exposure method8 Oct 2026US 2026/0310089 A1SCREEN Holdings Co., Ltd.
- Optical system including optical filter and corresponding method1 Oct 2026US 2026/0299430 A1Taiwan Semiconductor Manufacturing Company.Ltd
- An illumination module for a metrology device24 Sep 2026US 2026/0287151 A1ASML Netherlands B. V.
- Optical system for guiding illumination and imaging light from a light source to an image field3 Sep 2026US 2026/0259358 A1
- Modulation of X-Ray Beam Intensity27 Aug 2026US 2026/0251980 A1LumArray, Inc.
Most cited
By later US patents
- High-efficiency, multilevel, diffractive optical elements373US 4,895,790 AMassachusetts Institute of Technology · 1990
- Resolution doubling lithography technique121US 4,947,413 AAT&T Bell Laboratories · 1990
- Projection exposure apparatus111US 5,610,684 ANikon Corporation · 1997
- Projection exposure apparatus110US 5,677,757 ANikon Corporation · 1997
- High-efficiency, multilevel, diffractive optical elements99US 5,218,471 AMassachusetts Institute of Technology · 1993