Projection exposure apparatus
AssigneeNikon Corporation
InventorNaomasa Shiraishi
Life of this patent
Estimating the term…
Abstract
A projection exposure apparatus having an illuminating optical system for irradiating a mask having a pattern with illuminating light for exposure, and a projection optical system which is composed of a plurality of optical elements and arranged to take in light emanating from the pattern of the mask and to project an image of the pattern on a photosensitive substrate with predetermined image-forming characteristics. The projection exposure apparatus is provided with a movable retaining member for causing at least one of a plurality of lens elements constituting the projection optical system to move relative to the entire projection optical system in accordance with exchange, loading or unloading of an optical corrector plate, e.g., a pupil filter, which is disposed on a Fourier transform plane of the projection optical system.
Claims22
A projection exposure apparatus having an illuminating optical system for irradiating a mask having a pattern with illuminating light for exposure, and a projection optical system which is composed of a plurality of optical elements and arranged along an optical axis of said projection optical system to receive light emanating from the pattern of said mask and to project an image of said pattern on a photosensitive substrate with predetermined image-forming characteristics, said projection exposure apparatus comprising:
- an optical corrector plate inserting device whereby an optical corrector plate which changes a specific factor in said image-forming characteristics is removably inserted into a space including a Fourier transform plane of said projection optical system;
- and
- an optical element moving device for causing at least one of said optical elements to move relative to the entire projection optical system in accordance with insertion of said optical corrector plate.
A projection exposure apparatus having a projection optical system which is composed of a plurality of optical elements arranged along an optical axis of said projection optical system for projecting an image of pattern of a mask on a substrate, said projection exposure apparatus comprising:
- an optical plate that changes image-forming characteristics adapted to be disposed in a space including a Fourier transform plane of said projection optical system;
- and
- an adjusting device for moving at least one of said optical elements to adjust an image aberration,
- wherein said image-forming characteristics include said image aberration.
A projection exposure method for projecting an image of pattern of a mask on a substrate using a projection optical system which is composed of a plurality of optical elements arranged along an optical axis of said projection optical system, said projection exposure method comprising:
- inserting an optical plate into a space including a Fourier transform plane of said projection optical system;
- and
- moving at least one of said optical elements in accordance with insertion of said optical plate.
A projection exposure method for projecting an image of pattern of a mask on a substrate using a projection optical system which is composed of a plurality of optical elements arranged along an optical axis of said projection optical system, said projection exposure method comprising:
- moving an optical plate relative to a space including a Fourier transform plane of said projection optical system;
- and
- adjusting an image aberration by moving at least one of said optical elements in accordance with movement of said optical plate.
Dependencies are inferred from the claim text.