Imaging via zeroth order suppression

An extreme ultraviolet (EUV) projection system for forming an image on a substrate by use of an EUV radiation beam that is shaped by a patterning device, the EUV projection system comprising:

• a plurality of reflective elements,
• wherein at least one reflective element of the plurality of reflective elements system comprises an aperture to pass radiation therethrough, and
• wherein:
• the aperture is arranged to pass the shaped EUV radiation beam therethrough and subsequently to receive therein a zeroth order portion of the shaped EUV radiation beam to suppress the zeroth order portion, while the at least one reflective element is configured to direct the unsuppressed portion of the shaped EUV radiation beam towards the substrate, or
• a reflecting element is located in an optical path of the shaped EUV radiation beam from the at least reflective element towards the substrate, the zeroth order portion suppressed at the reflecting element while the unsuppressed portion of the shaped EUV radiation beam passes the reflecting element towards the substrate.

An extreme ultraviolet (EUV) lithographic apparatus, comprising:

• a patterning device support structure configured to support a patterning device comprising a pattern of reflective regions and partially reflective regions, wherein the patterning device is configured to shape an EUV radiation beam to form a shaped EUV radiation beam, and wherein the patterning device comprises an attenuated phase shift mask (PSM) having a hard PSM pattern;
• and
• a projection system configured to:
• suppress a zeroth order portion of the shaped EUV radiation beam, and
• direct an unsuppressed portion of the shaped EUV radiation beam towards a substrate to form an image on the substrate.

A method, comprising:

• generating an extreme ultraviolet (EUV) radiation beam;
• applying a phase shift to a portion of the EUV radiation beam using a patterning device comprising an attenuated phase shift mask (PSM) having a hard PSM pattern;
• suppressing a zeroth order portion of the phase shifted EUV radiation beam;
• and
• directing, via a projection system, an unsuppressed portion of the phase shifted EUV radiation beam towards a substrate to form an image on the substrate.