G03F 7/70316
Details of optical elements
Official title: {Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements}
G03F7/70316 (Details of optical elements) appears on 300 US grants and 423 published applications in this corpus.
Search patents in G03F- Granted patents
- 300
- Published applications
- 423
- Assignees
- 86
- Inventors
- 715
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 3 | 2 |
| 2002 | 1 | 5 |
| 2003 | 2 | 6 |
| 2004 | 5 | 7 |
| 2005 | 9 | 12 |
| 2006 | 2 | 10 |
| 2007 | 2 | 14 |
| 2008 | 5 | 10 |
| 2009 | 6 | 4 |
| 2010 | 7 | 7 |
| 2011 | 6 | 11 |
| 2012 | 9 | 20 |
| 2013 | 11 | 11 |
| 2014 | 11 | 17 |
| 2015 | 8 | 15 |
| 2016 | 19 | 28 |
| 2017 | 22 | 14 |
| 2018 | 22 | 26 |
| 2019 | 28 | 24 |
| 2020 | 21 | 26 |
| 2021 | 23 | 14 |
| 2022 | 16 | 22 |
| 2023 | 9 | 18 |
| 2024 | 10 | 28 |
| 2025 | 19 | 37 |
| 2026 | 17 | 35 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Mirror, optical system and method for operating an optical system6 Oct 2026US 12,754,483 B2Carl Zeiss SMT GmbH
- Light source apparatus, lithography apparatus, and article manufacturing method25 Aug 2026US 12,717,240 B2Canon Kabushiki Kaisha
- Lithography apparatus, patterning system, and method of patterning a layered structure4 Aug 2026US 12,699,323 B2APPLIED Materials.Inc.
- Systems and methods for combinatorial arrays using dynamic interference lithography4 Aug 2026US 12,699,325 B2Rutgers, The State University of New Jersey
- Method for depositing a cover layer, EUV lithography system and optical element4 Aug 2026US 12,699,330 B2Carl Zeiss SMT GmbH
- Systems and methods for combinatorial arrays using dynamic interference lithography8 Oct 2026US 2026/0310091 A1Rutgers, The State University of New Jersey
- Optical system including optical filter and corresponding method1 Oct 2026US 2026/0299430 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Optical system for guiding illumination and imaging light from a light source to an image field3 Sep 2026US 2026/0259358 A1
- Modulation of X-Ray Beam Intensity27 Aug 2026US 2026/0251980 A1LumArray, Inc.
- Multilayer metasurface superlens and surface plasmon lithography method20 Aug 2026US 2026/0243923 A1Institute of Microelectronics, Chinese Academy of Sciences
Most cited
By later US patents
- Projection exposure apparatus and method which uses multiple diffraction gratings in order to produce a solid state device with fine patterns855US 5,715,039 AHitachi, Ltd. · 1998
- Compact edge illuminated diffractive display120US 9,075,184 B22015
- Projection exposure method and apparatus100US 6,211,944 B1Nikon Corporation · 2001
- Exposure apparatus and method for producing device86US 7,388,649 B2Nikon Corporation · 2008
- Projection exposure apparatus75US 6,252,647 B1Nikon Corporation · 2001