Systems and methods for combinatorial arrays using dynamic interference lithography
AssigneeRutgers, The State University of New Jersey
InventorsKi-Bum Lee, Letao Yang
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Abstract
A dynamic interference lithography (DIL) device is provided. The device includes a laser source configured for providing a laser beam, a substrate stage configured for mounting a substrate, an at least partially convex curved mirror, and a spatial filter configured to divide the laser beam into a first beam portion directed towards the at least partially convex curved mirror and a second beam portion directed towards the substrate. The first beam portion is reflected by the at least partially convex curved mirror towards the substrate to form an interference pattern on the substrate.
Claims9
A dynamic interference lithography (DIL) device comprising:
- a laser source configured for providing a laser beam;
- a substrate stage configured for mounting a substrate;
- an at least partially convex curved mirror mounted on a rotatable stage;
- and
- a spatial filter configured to divide the laser beam into a first beam portion directed toward the at least partially convex curved mirror and a second beam portion directed toward the substrate,
- wherein the first beam portion is reflected by the at least partially convex curved mirror toward the substrate to form an interference pattern on the substrate,
- wherein the rotatable stage is configured to adjust a location on the at least partially convex curved mirror where the first beam portion is reflected from.
Dependencies are inferred from the claim text.