Projection exposure apparatus

A projection expo sure apparatus comprising:

• a light source;
• an illumination optical system including a plurality of optical integrators including at least a first optical integrator and a second optical integrator, the first optical integrator is disposed between the light source and a first plane, perpendicular to an optical axis of the illumination system on which a pattern is arranged, to illuminate the pattern with light from the light source through the first optical integrator, the first optical integrator is exchanged for the second optical integrator in response to a change of a distribution of light on a Fourier transform plane in said illumination optical system with respect to the pattern;
• a projection optical system on which light generated from the pattern is incident to project an image of the pattern onto a second plane;
• and
• a light distributing member interposed between said light source and one of the plurality of optical integators disposed in the illumination optical system to distribute light from said light source into at least two portions, on the Fourier transform plane, apart from an optical axis of said illumination optical system.

A projection exposure apparatus comprising:

• an illumination optical system, including a light source, for irradiating a mask with light from the light source;
• a projection optical system that projects an image of a pattern provided on said mask onto a substrate;
• a plurality of optical integrators provided in said illumination optical system, that form secondary light sources separated from each other on the Fourier transform plane for said pattern;
• a position adjusting device connected with said plurality of optical integrators, that sets respective centers of said plurality of optical integrators in positions apart from an optical axis of said illumination optical system;
• and
• an input optical system that makes light from said light source incident on at least two of said plurality of optical integrators.

A projection exposure apparatus comprising:

• an illumination optical system, including a light source, for irradiating a mask with light from the light source;
• a projection optical system for projecting an image of a pattern on said mask onto a substrate;
• a plurality of optical integrators provided in said illumination optical system, for forming secondary light sources separated from each other on a Fourier transform plane for said pattern;
• a holding device for holding said plurality of optical integrators so that respective centers of said plurality of optical integrators are positioned apart from an optical axis of said illumination optical system;
• and
• an input optical system for making light from said light source incident on at least two of said plurality of optical integrators set by said holding member.

A projection exposure apparatus comprising:

• an illumination optical system, including a light source, for irradiating a mask with illumination light from the light source;
• a projection optical system for projecting an image of a pattern provided on said mask onto a substrate;
• a plurality of first off-axis optical integrators to form secondary light sources separated from each other;
• a plurality of second off-axis optical integrators of which the distances from an optical axis of said illumination optical system are different from that of said first off-axis optical integrators;
• first and second holding members each holding said first off-axis optical integrators and second off-axis optical integrators;
• and
• a switching member for exchangeably placing each of said first and second holding members in an optical path of said illumination optical system.

A projection exposure apparatus comprising:

• an illumination optical system, including a light source, for irradiating a mask with light from the light source;
• a projection optical system for projecting an image of a pattern provided on said mask onto a substrate;
• a plurality of optical integrators including a first optical integrator for forming a secondary light source about an optical axis of said illumination optical system on a Fourier transform plane for said pattern, and a second optical integrator consisting of a plurality of optical integrators for forming secondary light sources separated from each other on said Fourier transform plane;
• a plurality of holding members including a first holding member for holding said first optical integrator, and a second holding member for integrally holding said plurality of optical integrators so that respective centers of said plurality of optical integrators of said second optical integrator are set in discrete positions eccentric from said optical axis of said illumination optical system;
• a first switching member for exchangeably placing each of said plurality of holding members in an optical path of said illumination optical system;
• a first input optical system for concentrating light from said light source on said first optical integrator;
• a second input optical system for concentrating light from said light source on said second optical integrator;
• and
• a second switching member for exchangeably placing each of said first input optical system and second input optical system in accordance with a holding member provided in the optical path of said illumination optical system by said first switching member.

A projection exposure apparatus comprising:

• a light source;
• an illumination optical system disposed between the light source and a first plane, perpendicular to an optical axis of the illumination optical system, on which a pattern is arranged to illuminate the pattern with light from the light source;
• a projection optical system on which light generated from the pattern is incident to project an image of the pattern onto a second plane;
• a movable optical member disposed on an optical path through which light from the light source passes to change an incident position of the light from the light source on a Fourier transform plane in the illumination optical system with respect to the pattern;
• and
• a drive member connected with said movable optical member to alternately direct light from the light source to at least two portions, on the Fourier transform plane apart from an optical axis of the illumination optical system, by moving the movable optical member within the optical path in the illumination optical system.

A projection exposure apparatus comprising:

• (a) a light source for emitting illumination light;
• (b) an illumination optical system for irradiating a mask on which a pattern is provided, with the illumination light;
• (c) a projection optical system using light from the irradiated mask for forming an image of said pattern onto a substrate;
• and
• (d) an optical member provided in said illumination optical system, which divides the illumination light into four light beams, said four light beams passing through four mutually separated portions, on a Fourier transform plane for said pattern in said illumination optical system, apart from an optical axis of the illumination optical system, two of said four portions being disposed such that a 0-order diffracted beam and one first-order diffracted beam generated from said pattern by irradiation of two light beams which pass through said two portions pass through positions having substantially equal distances from an optical axis of said projection optical system on a Fourier transform plane in said projection optical system for said pattern, the other two portions being disposed to be substantially symmetrical with said two portions with respect to the optical axis of said illumination optical system.

A projection exposure apparatus comprising:

• (a) a light source;
• (b) an illumination optical system to illuminate a pattern periodic in first and second directions on a mask with light from the light source;
• (c) a projection optical system using light from the illuminated mask to project an image of said pattern onto a substrate;
• and
• (d) an optical member which receives light from said light source and provides from the received light four light beams incident on four portions apart from, and symmetrical with respect to, an optical axis of the illumination optical system so that a 0-order diffracted beam, one non-0-order diffracted beam in the first direction and one non-0-order diffracted beam in the second direction produced from the pattern by the irradiation of a light beam from the optical device are distributed apart by substantially equal distances from an optical axis of the projection optical system.

A projection exposure apparatus comprising:

• (a) a light source;
• (b) an illumination optical system to illuminate a pattern periodic in first and second directions on a mask with light from the light source;
• (c) a projection optical system using light from the illuminated mask to project an image of said pattern onto a substrate;
• and
• (d) an optical device that increases an intensity distribution of light from the light source within four portions apart from, and symmetrical with respect to, an optical axis of said illumination optical system relative to a portion including the optical axis so that a 0-order diffracted beam, one non-0-order diffracted beam in the first direction and one non-0-order diffracted beam in the second direction produced from the pattern by the irradiation of light from each of the four portions are distributed apart by substantially equal distances from an optical axis of the projection optical system.

A projection exposure apparatus comprising:

• (a) a light source;
• (b) an illumination optical system which illuminates with light from the light source a mask having a pattern periodic in a first direction;
• (c) a projection optical system using light from the illuminated mask to project an image of said pattern onto a substrate;
• and
• (d) an optical member which provides from light from said light source, four illumination sources on a Fourier transform plane in said illumination optical system for said pattern, within four quadrants divided by a first axis defined along said first direction and a second axis defined along a second direction crossing said first direction, said first and second axes intersecting at an optical axis of said illumination optical system.

A projection exposure apparatus comprising:

• (a) a light source;
• (b) an illumination optical system to illuminate a pattern on a mask with light from the light source;
• (c) a projection optical system using light from the illuminated mask to project an image of said pattern onto a substrate;
• (d) an optical integrator having an incidence surface and an exit surface, to form a secondary light source;
• (e) a first optical member which makes light from said light source incident on said optical integrator so that an intensity of light on said incidence surface is increased within a first portion relative to, and outside of, a second portion including an optical axis of said illumination optical system;
• and
• (f) a second optical member which decreases an intensity of said secondary light source within a cross-like portion on said optical axis relative to the surrounding of said cross-like portion.

A projection exposure apparatus comprising:

• (a) a light source
• (b) an illumination optical system which irradiates a mask with light from the light source, said mask having a pattern periodic in a first direction and in a second direction perpendicular to said first direction;
• (c) a projection optical system using light from the irradiated mask which projects an image of said pattern on a substrate;
• and
• (d) an optical device which increases an intensity of light in at least one area, relative to the surrounding of the at least one area, away from an optical axis of said illumination optical system on a Fourier transform plane in said illumination optical system so that three diffracted beams are produced from said pattern by the irradiation of light passing through said at least one area, said three diffracted beams consisting of a 0-order diffracted beam, one non-0-order diffracted beam produced in a first axis defined along said first direction, and one non-0order diffracted beam produced in a second axis defined along said second direction, wherein said at least one area being determined so that three areas through which said three diffracted beams pass, respectively, on a Fourier transform plane in said projection optical system for said pattern are positioned at substantially equal distances from an optical axis of said projection optic al system.

A projection exposure apparatus comprising:

• an illumination optical system to illuminate a pattern with light;
• a projection optical system to project an image of the illuminated pattern onto a substrate;
• a first optical integrator;
• a second optical integrator having a plurality of off-axis integrators separated from each other so that a secondary light source formed by the second optical integrator has a decreased intensity portion on an optical axis of the illumination optical system;
• and
• a holding device holding the first and second optical integrator s to provide one of the first and second optical integrators in an optical path of the illumination optical system.