G03F 7/70275
Multiple projection paths
Official title: {Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems}
G03F7/70275 (Multiple projection paths) appears on 570 US grants and 581 published applications in this corpus.
Search patents in G03F- Granted patents
- 570
- Published applications
- 581
- Assignees
- 133
- Inventors
- 724
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 2 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 2 | 0 |
| 1992 | 0 | 0 |
| 1993 | 2 | 0 |
| 1994 | 4 | 0 |
| 1995 | 2 | 0 |
| 1996 | 4 | 0 |
| 1997 | 14 | 0 |
| 1998 | 19 | 0 |
| 1999 | 11 | 0 |
| 2000 | 13 | 0 |
| 2001 | 20 | 6 |
| 2002 | 16 | 16 |
| 2003 | 18 | 30 |
| 2004 | 14 | 35 |
| 2005 | 21 | 53 |
| 2006 | 49 | 59 |
| 2007 | 41 | 58 |
| 2008 | 36 | 36 |
| 2009 | 24 | 39 |
| 2010 | 26 | 28 |
| 2011 | 15 | 12 |
| 2012 | 20 | 23 |
| 2013 | 23 | 23 |
| 2014 | 23 | 25 |
| 2015 | 29 | 17 |
| 2016 | 29 | 15 |
| 2017 | 13 | 8 |
| 2018 | 8 | 16 |
| 2019 | 14 | 16 |
| 2020 | 13 | 17 |
| 2021 | 12 | 6 |
| 2022 | 7 | 11 |
| 2023 | 6 | 11 |
| 2024 | 6 | 10 |
| 2025 | 9 | 8 |
| 2026 | 4 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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- Method and apparatus for greyscale lithography28 Apr 2026US 12,613,469 B2APPLIED Materials.Inc.
- Systems and methods for lithographic tools with increased tolerances4 Nov 2025US 12,461,449 B2ASML Netherlands B. V.
- Spatial light modulation unit and exposure device25 Jun 2026US 2026/0177809 A1Nikon Corporation
- Devices, systems, and methods for high resolution photolithography11 Jun 2026US 2026/0161095 A1
- On tool metrology scheme for advanced packaging19 Feb 2026US 2026/0050227 A1APPLIED Materials.Inc.
- Lithography apparatus, patterning system, and method of patterning a layered structure20 Nov 2025US 2025/0355345 A1APPLIED Materials.Inc.
- Direct imaging system and direct imaging method25 Sep 2025US 2025/0298322 A1SCREEN Holdings Co., Ltd.
Most cited
By later US patents
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Projection exposure apparatus and method with workpiece area detection611US 6,191,429 B1Nikon Precision Inc. · 2001
- Microlens scanner for microlithography and wide-field confocal microscopy461US 6,133,986 A2000
- High-throughput, maskless lithography system299US 6,177,980 B12001
- Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus256US 6,795,169 B2Nikon Corporation · 2004