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AssigneeASML Netherlands B.V.
InventorsJasper Winters, John Erwin Van Zwer, Johannes Marcus Van Der Lans, Willem Herman Pieter De Jager, Anton Emiel Van De Ven
Estimating the term…
A method of use for a lithographic tool includes scanning a substrate relative to a first micro-lens array (MLA) and a second MLA each having rows of lenslets. The first MLA has functional lenslets and extra lenslets and the scanning includes delivering light through the lenslets of the first MLA and second MLA to the substrate. The delivering includes delivering light through the functional lenslets to form a pattern on the substrate, the pattern having gaps caused by a positional or rotational misalignment between the functional lenslets of the first MLA and the second MLA. The delivering also includes delivering light through the extra lenslets to fill the gaps in the pattern.
A method of use for a lithographic tool, the method comprising:
A lithography system comprising:
Dependencies are inferred from the claim text.