Method and apparatus for greyscale lithography

An image projection system for performing lithography, comprising:

• a deuterium light source comprising an array of deuterium light sources;
• an elliptical reflector downstream of the deuterium light source along a beam path from the deuterium light source, wherein the array of deuterium light sources are substantially parallel to a major axis of the elliptical reflector;
• an optical integrator disposed downstream of the elliptical reflector;
• a mirror disposed immediately downstream of the optical integrator;
• a collimating lens disposed downstream of the mirror;
• and
• a stage disposed downstream of the collimating lens.

A method of fabricating an optical device, the method comprising:

• exposing a portion of a resist disposed over a substrate with light beams based on a determined exposure pattern using an image projection system comprising:
• a deuterium light source comprising an array of deuterium light sources;
• an elliptical reflector downstream of the deuterium light source along a beam path from the deuterium light source, wherein the array of deuterium light sources are substantially parallel to a major axis of the elliptical reflector;
• an optical integrator disposed downstream of the elliptical reflector:
• a mirror disposed immediately downstream of the optical integrator;
• a collimating lens disposed downstream of the mirror;
• and
• a stage disposed downstream of the collimating lens, wherein exposing the portion of the resist comprises directing the light beams from the array of deuterium light sources to the stage;
• and
• developing the resist.