Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus

An exposure method comprising the steps of:

• forming a plurality of exposure fields using a plurality of projection optical systems, each of the projection optical systems projects a predetermined pattern onto a substrate;
• and
• exposing the pattern onto the substrate while moving the substrate along at least a scanning direction extending in a straight line;
• wherein the plurality of exposure fields are aligned in a direction crossing the scanning direction.

An image projection apparatus comprising:

• at least one light source;
• a plurality of illumination optical systems;
• a plurality of projection optical systems, each of the projection optical systems projecting a predetermined pattern onto a predetermined plane based on a light from one of the plurality illumination optical systems;
• and
• a light guide arranged along an optical path between the at least one light source and the plurality of illumination optical systems, and having at least one input end which optically connects to the at least one light source and a plurality of output ends, wherein each of the plurality of output ends optically connects to one of the plurality of illumination optical systems.