Immersion type projection exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorKazuo Takahashi
Life of this patent
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Abstract
A projection exposure apparatus includes an illuminating device for illuminating a pattern of an original, a holder for holding a substrate, and a projection system for projecting an image of the pattern of the original onto the substrate. The projection system includes a projection optical system and a plane optical element spaced from the projection optical system and disposed opposite to the surface of the substrate. Also provided is a casing having a filled interspace formed between the optical element and the substrate, with the optical element providing an upper cover of the casing.
Claims29
A projection exposure apparatus, comprising:
- illumination means for illuminating a pattern of an original;
- holding means for holding a substrate;
- a projection system for projecting an image of the pattern of the original onto the substrate held by said holding means, said projection system including a projection optical system and a plane optical element spaced from said projection optical system and disposed opposite to the surface of the substrate;
- and
- a casing having a filled interspace formed between said optical element and the substrate, wherein said optical element provides an upper cover of said casing, and a portion of an outer wall of said casing is covered by a heat insulating material.
A projection exposure apparatus, comprising:
- illumination means for illuminating a pattern of an original;
- holding means for holding a substrate;
- a projection system for projecting an image of the pattern of the original onto the substrate held by said holding means, said projection system including a projection optical system and a plane optical element spaced from said projection optical system and disposed opposite to the surface of the substrate;
- a casing having a filled interspace formed between said optical element and the substrate opposed to each other, wherein said optical element provides an upper cover of said casing;
- and
- a pressure gauge for detecting the pressure of a filling liquid disposed in the interspace.
A projection exposure apparatus, comprising:
- illumination means for illuminating a pattern of an original;
- holding means for holding a substrate;
- a projection system for projecting an image of the pattern of the original onto the substrate held by said holding means, said projection system including a projection optical system and a plane optical element spaced from said projection optical system and disposed opposite to the surface of the substrate;
- a casing having a filled interspace between said optical element and the substrate, wherein said optical element provides an upper cover of said casing;
- and
- ultrasonic vibration means for vibrating a filling liquid filling the interspace with ultrasonic vibrations.
A projection exposure apparatus, comprising:
- illumination means for illuminating a pattern of an original;
- holding means for holding a substrate;
- a projection system for projecting an image of the pattern of the original onto the substrate held by said holding means, said projection system including a projection optical system and a plane optical element spaced from said projection optical system and disposed opposite to the surface of the substrate;
- a casing having a filled interspace formed between said optical element and the substrate, wherein said optical element provides an upper cover of said casing;
- and
- attitude control means for tilting or holding said casing upright, wherein during injection of a filling liquid into the interspace said casing is tiled or held upright so that the liquid is injected thereinto from below.
A projection exposure apparatus, comprising:
- illumination means for illuminating a pattern of an original;
- holding means for holding a substrate;
- a projection system for projecting an image of the pattern of the original onto the substrate held by said holding means, said projection system including a projection optical system and a plane optical element spaced from said projection optical system and disposed opposite to the surface of the substrate;
- a casing having a filled interspace formed between said optical element and the substrate, wherein said optical element provides an upper cover of said casing;
- and
- means for measuring the refractive index of a filling material filling the interspace.
Dependencies are inferred from the claim text.