G03F 7/70341
Details of immersion lithography aspects
Official title: {Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041)}
G03F7/70341 (Details of immersion lithography aspects) appears on 1,993 US grants and 2,477 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,993
- Published applications
- 2,477
- Assignees
- 161
- Inventors
- 1,942
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 3 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 2 | 0 |
| 2002 | 0 | 0 |
| 2003 | 2 | 5 |
| 2004 | 4 | 26 |
| 2005 | 8 | 136 |
| 2006 | 49 | 228 |
| 2007 | 83 | 279 |
| 2008 | 128 | 276 |
| 2009 | 113 | 240 |
| 2010 | 150 | 153 |
| 2011 | 156 | 176 |
| 2012 | 152 | 130 |
| 2013 | 135 | 106 |
| 2014 | 187 | 85 |
| 2015 | 133 | 103 |
| 2016 | 140 | 90 |
| 2017 | 135 | 121 |
| 2018 | 111 | 100 |
| 2019 | 105 | 77 |
| 2020 | 57 | 32 |
| 2021 | 39 | 28 |
| 2022 | 29 | 27 |
| 2023 | 20 | 17 |
| 2024 | 16 | 21 |
| 2025 | 17 | 10 |
| 2026 | 12 | 11 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Gripper and lithographic apparatus comprising the gripper8 Sep 2026US 12,730,386 B2ASML Netherlands B. V.
- Immersion fluid recovery system and immersion fluid recovery method using said system25 Aug 2026US 12,717,241 B2Zhejiang Cheer Technology Co., Ltd.
- Method of operating semiconductor apparatus25 Aug 2026US 12,717,242 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Substrate table, lithographic apparatus, sticker, cover ring and method of operating a lithographic apparatus4 Aug 2026US 12,699,324 B2ASML Netherlands B. V.
- Lithographic apparatus and an object positioning system28 Jul 2026US RE50,970 E1ASML Netherlands B. V.
- Fluid handling system and method, and method of manufacturing devices17 Sep 2026US 2026/0277111 A1ASML Netherlands B. V.
- Preparation of polymer, preparation of chemically amplified resist composition, resist pattern forming process, polymer, and chemically amplified resist composition3 Sep 2026US 2026/0259497 A1Shin-Etsu Chemical Co., Ltd.
- Liquid supply and discharge device, liquid supply and discharge method, immersion objective lens system, gene sequencer, and biochemical assay method27 Aug 2026US 2026/0251894 A1MGI Tech Co., Ltd.
- Gas supply module, fluid handling system, lithographic apparatus and device manufacturing method13 Aug 2026US 2026/0235962 A1ASML Netherlands B. V.
- Fluid handling system and method in which defects due to liquid left on a substrate can be reduced and lithographic apparatus comprising the fluid handling system6 Aug 2026US 2026/0227704 A1ASML Netherlands B. V.
Most cited
By later US patents
- Photolithographic method for the manufacture of integrated circuits1,126US 4,346,164 A1982
- Immersion type projection exposure apparatus1,116US 5,610,683 ACanon Kabushiki Kaisha · 1997
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Pattern forming apparatus1,002US 4,480,910 AHitachi, Ltd. · 1984
- Apparatus for the photolithographic manufacture of integrated circuit elements958US 4,509,852 A1985