Fluid handling system and method in which defects due to liquid left on a substrate can be reduced and lithographic apparatus comprising the fluid handling system

A fluid handling structure for an immersion lithographic apparatus, the fluid handling structure configured to confine immersion liquid to a space between a bottom surface of the fluid handling structure and a surface of a substrate and/or a substrate support supporting the substrate, the fluid handling structure having:

• a feature in the bottom surface having a substantially polygonal shape defined by a plurality of sides;
• an opening configured to supply immersion fluid to the space;
• an extractor configured to extract immersion fluid from the space;
• and
• an immersion fluid recovery arrangement outside the feature and proximate a side of the feature, wherein the immersion fluid recovery arrangement comprises:
• an immersion fluid manipulator comprising one or more fluid supply openings configured to form an elongate wiper zone extending at an angle to the side of the feature, wherein the angle is in the range of from about 60° to 90°, and
• an immersion fluid recovery opening configured to extract immersion fluid.