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AssigneeASML Netherlands B.V.
InventorsGijs Kramer, Christianus Wilhelmus Johannes Berendsen, Stijn Van Pelt, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Erik Willem Bogaart
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A substrate table, for use in an immersion lithographic apparatus, having a support area defining a support plane to support a substrate to be patterned and an upper surface surrounding the support area, wherein: the upper surface has an outer region that is substantially planar and a transition region proximate the support area; and the transition region is not co-planar with the outer region so as to ameliorate a level transition between the outer region and a non-standard substrate, which has a thickness different than a distance between the support plane and a nominal plane defined by the outer region.
A substrate table for use in an immersion lithographic apparatus, the substrate table comprising a support area defining a support plane to support a substrate to be patterned and an upper surface surrounding the support area, wherein:
A sticker for use with a substrate table of an immersion lithographic apparatus, the sticker having a shape and configuration to define a transition region of an upper surface of the substrate table, the transition region being effective to reduce a level transition between an outer region of the upper surface of the substrate table and a substrate held by the substrate table, the substrate having a thickness greater than the height of the upper surface of the outer region relative to the support plane for the substrate.
A cover ring for use with a substrate table of an immersion lithographic apparatus, the cover ring having a shape and configuration to define a transition region of an upper surface of the substrate table, the transition region being effective to reduce a level transition between an outer region of the upper surface of the substrate table and a substrate held by the substrate table, the outer region being a separate structure from the cover ring and the substrate having a thickness different than the height of the upper surface of the outer region relative to the support plane for the substrate.
Dependencies are inferred from the claim text.