G03F 7/70225
Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
Official title: {Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements}
G03F7/70225 (Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements) appears on 524 US grants and 440 published applications in this corpus.
Search patents in G03F- Granted patents
- 524
- Published applications
- 440
- Assignees
- 77
- Inventors
- 404
- Latest grant
- 29 Jul 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 2 | 0 |
| 1980 | 0 | 0 |
| 1981 | 2 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 2 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 6 | 0 |
| 1988 | 3 | 0 |
| 1989 | 3 | 0 |
| 1990 | 3 | 0 |
| 1991 | 3 | 0 |
| 1992 | 3 | 0 |
| 1993 | 6 | 0 |
| 1994 | 6 | 0 |
| 1995 | 1 | 0 |
| 1996 | 8 | 0 |
| 1997 | 14 | 0 |
| 1998 | 24 | 0 |
| 1999 | 10 | 0 |
| 2000 | 19 | 0 |
| 2001 | 10 | 10 |
| 2002 | 21 | 21 |
| 2003 | 33 | 32 |
| 2004 | 25 | 34 |
| 2005 | 26 | 39 |
| 2006 | 32 | 40 |
| 2007 | 25 | 29 |
| 2008 | 27 | 50 |
| 2009 | 18 | 25 |
| 2010 | 31 | 14 |
| 2011 | 18 | 21 |
| 2012 | 14 | 18 |
| 2013 | 17 | 14 |
| 2014 | 25 | 18 |
| 2015 | 12 | 15 |
| 2016 | 20 | 12 |
| 2017 | 15 | 8 |
| 2018 | 13 | 14 |
| 2019 | 7 | 5 |
| 2020 | 4 | 5 |
| 2021 | 8 | 2 |
| 2022 | 1 | 1 |
| 2023 | 3 | 3 |
| 2024 | 1 | 2 |
| 2025 | 1 | 6 |
| 2026 | 0 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Projection exposure apparatus for semiconductor lithography29 Jul 2025US 12,372,877 B2Carl Zeiss SMT GmbH
- Optical system with an aperture stop1 Oct 2024US 12,105,429 B2Carl Zeiss SMT GmbH
- Phase shift device including metal-dielectric composite structure4 Jul 2023US 11,693,237 B2Korea Advanced Institute of Science and Technology
- Method to achieve tilted patterning with a through resist thickness using projection optics9 May 2023US 11,644,757 B2Intel Corporation
- UV lithography system24 Jan 2023US 11,561,476 B1
- Component for a system of semiconductor technology and method for producing a component for a system of semiconductor technology20 Aug 2026US 2026/0244112 A1Carl Zeiss SMT GmbH
- Method for evaluating measurement values of an aberration of a projection lens26 Feb 2026US 2026/0056476 A1ASML Netherlands B. V.
- Production control method for a projection exposure apparatus, projection exposure apparatus, and projection exposure method21 Aug 2025US 2025/0264807 A1Carl Zeiss SMT GmbH
- Mirror device, for example for a microlithographic projection exposure system, and method for measuring the temperature of a mirror3 Jul 2025US 2025/0216794 A1
- Residual gas analyser, projection exposure apparatus comprising a residual gas analyser and method of residual gas analysis29 May 2025US 2025/0174452 A1Carl Zeiss SMT GmbH
Most cited
By later US patents
- Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus256US 6,795,169 B2Nikon Corporation · 2004
- Catadioptric system for photolithography217US 5,835,275 ANikon Corporation · 1998
- Catadioptric optical system and exposure apparatus having the same200US 5,689,377 ANikon Corporation · 1997
- Catadioptric system and exposure apparatus having the same190US 5,668,672 ANikon Corporation · 1997
- Ultra-broadband UV microscope imaging system with wide range zoom capability168US 5,999,310 A1999