Method for evaluating measurement values of an aberration of a projection lens

A microlithographic projection exposure apparatus comprising:

• a projection lens configured to image mask structures onto a substrate and having a plurality of optical elements,
• a manipulator system configured to manipulate at least one of the optical elements in at least one degree of freedom of movement for carrying out a rigid body movement,
• a measuring module configured to determine measured values of at least one aberration of the projection lens at a plurality of field points in a field plane of the projection lens, and
• an extrapolation device configured to extrapolate the measured values determined at the plurality of field points to further field points of the projection lens and having a fitting module that is configured to fit a fit function to the determined measured values, wherein the fit function comprises a polynomial function that depends on two variables formed as spatial coordinates which define the field plane and a further term that comprises rigid body sensitivities for multiple locations in the field plane that each describe a dependence of the at least one aberration on a degree of freedom of movement at the locations, and wherein the manipulator system is configured to control the degree of freedom of movement.