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US 12,105,429 B2Granted
Optical system with an aperture stop
AssigneeCarl Zeiss SMT GmbH
InventorsTanja Mueller, Rudi Littelink
Life of this patent
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Abstract
The disclosure relates to an optical system, for example a lithography system, comprising an aperture stop having an aperture with an edge for delimiting a beam path of the optical system on its outer circumference. The optical system also includes a heat stop arranged upstream of the aperture stop for partially shading the aperture stop. The edge of the aperture stop is excluded from the shading.
Claims20
An optical system, comprising:
- an aperture stop comprising a solid portion and an aperture with, the aperture having an edge configured to delimit an outer circumference of a beam path of used radiation in the optical system;
- and
- a heat stop upstream of the aperture stop along the beam path of the used radiation in the optical system,
- wherein:
- the heat stop comprises a solid portion and an aperture;
- the aperture of the heat stop has an edge;
- the solid portion of the heat stop is configured to partially shade the solid portion of the aperture stop from extraneous radiation in the optical system, the extraneous radiation propagating outside of the beam path of the used radiation in the optical system;
- the edge of the aperture stop is excluded from the shading of the extraneous radiation in the optical system;
- there is a space between the edge of the aperture of the heat stop and the outer circumference of the beam path of the used radiation in the optical system so that the used radiation does not impinge on the solid portion of the heat stop;
- and
- the edge of the aperture of the heat stop is at most two millimeters from the outer circumference of the beam path of the used radiation in the optical system.
8 more elements
Dependencies are inferred from the claim text.