Back to results
US 12,372,877 B2Granted
Projection exposure apparatus for semiconductor lithography
AssigneeCarl Zeiss SMT GmbH
InventorsMarkus Raab, Andreas Raba, Mirko Buechsenschuetz, Matthias Manger
Life of this patent
Estimating the term…
Abstract
A projection exposure apparatus comprises an optical element. The optical element comprises a main body and an actuator for deforming an optically effective surface formed on the main body. The actuator is in a recess in the rear side of the main body.
Claims20
An apparatus, comprising:
- an optical element, comprising:
- a main body;
- and
- an actuator configured to deform an optically effective surface supported by the main body,
- wherein:
- the actuator is in a recess in a rear side of the main body;
- the actuator is mechanically connected to the main body and configured to exerts its force over lateral boundary surfaces of the recess;
- relative to the optically effective surface, an effective direction of the actuator runs at least in part in a normal direction to the optically effective surface;
- and
- the apparatus is a projection exposure apparatus.
7 more elements
An apparatus, comprising:
- an optical element, comprising:
- a main body;
- and
- a shear actuator configured to deform an optically effective surface supported by the main body,
- wherein:
- the shear actuator is in a recess in a rear side of the main body;
- the shear actuator is mechanically connected to the main body and configured to exerts its force over lateral boundary surfaces of the recess;
- the apparatus is a projection exposure apparatus.
5 more elements
Dependencies are inferred from the claim text.