G03F 7/70283
Mask effects on the imaging process
Official title: {Mask effects on the imaging process}
G03F7/70283 (Mask effects on the imaging process) appears on 1,438 US grants and 1,442 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,438
- Published applications
- 1,442
- Assignees
- 390
- Inventors
- 2,170
- Latest grant
- 1 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 2 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 6 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 4 | 0 |
| 1991 | 7 | 0 |
| 1992 | 8 | 0 |
| 1993 | 5 | 0 |
| 1994 | 21 | 0 |
| 1995 | 24 | 0 |
| 1996 | 27 | 0 |
| 1997 | 28 | 0 |
| 1998 | 21 | 0 |
| 1999 | 21 | 0 |
| 2000 | 21 | 0 |
| 2001 | 29 | 16 |
| 2002 | 36 | 35 |
| 2003 | 40 | 68 |
| 2004 | 45 | 68 |
| 2005 | 52 | 138 |
| 2006 | 96 | 154 |
| 2007 | 81 | 90 |
| 2008 | 75 | 97 |
| 2009 | 58 | 88 |
| 2010 | 82 | 65 |
| 2011 | 56 | 42 |
| 2012 | 49 | 45 |
| 2013 | 49 | 41 |
| 2014 | 54 | 49 |
| 2015 | 59 | 56 |
| 2016 | 54 | 44 |
| 2017 | 48 | 33 |
| 2018 | 31 | 33 |
| 2019 | 43 | 39 |
| 2020 | 40 | 43 |
| 2021 | 35 | 26 |
| 2022 | 29 | 36 |
| 2023 | 21 | 36 |
| 2024 | 31 | 39 |
| 2025 | 25 | 36 |
| 2026 | 17 | 25 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Edge placement with spatial light modulator writing1 Sep 2026US 12,724,352 B2Mycronic AB
- Lithography apparatus, patterning system, and method of patterning a layered structure4 Aug 2026US 12,699,323 B2APPLIED Materials.Inc.
- Systems and methods for distributing light delivery28 Jul 2026US 12,693,602 B2ASML Netherlands B. V.
- Tunable shrinkage and trim process for fabricating gratings9 Jun 2026US 12,650,379 B2Meta Platforms Technologies, LLC
- High accuracy temperature-compensated piezoresistive position sensing system2 Jun 2026US 12,645,069 B2ASML Netherlands B. V.
- Optical apparatus, exposure apparatus and exposure method8 Oct 2026US 2026/0310089 A1SCREEN Holdings Co., Ltd.
- Exposure apparatus and wiring pattern forming method8 Oct 2026US 2026/0310090 A1Nikon Corporation
- Run to run overlay compensation in lithography sequences employing different lithography methods8 Oct 2026US 2026/0310103 A1
- Digital lithography exposure unit boundary smoothing1 Oct 2026US 2026/0299433 A1APPLIED Materials.Inc.
- Pattern generator and method for driving pattern generator24 Sep 2026US 2026/0288013 A1Mycronic AB
Most cited
By later US patents
- Spatial light modulator and method846US 5,061,049 ATexas Instruments Incorporated · 1991
- Method and apparatus for patterning and imaging member753US 5,523,193 ATexas Instruments Incorporated · 1996
- Exposure device including an electrically aligned electronic mask for micropatterning662US 5,229,872 AHughes Aircraft Company · 1993
- Illumination device658US 5,296,891 AFraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. · 1994
- Spatial light modulator and method555US 5,096,279 ATexas Instruments Incorporated · 1992