G03F 7/70291
Addressable masks
Official title: {Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices}
G03F7/70291 (Addressable masks) appears on 902 US grants and 1,039 published applications in this corpus.
Search patents in G03F- Granted patents
- 902
- Published applications
- 1,039
- Assignees
- 262
- Inventors
- 1,261
- Latest grant
- 1 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 2 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 4 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 4 | 0 |
| 1992 | 6 | 0 |
| 1993 | 1 | 0 |
| 1994 | 4 | 0 |
| 1995 | 0 | 0 |
| 1996 | 6 | 0 |
| 1997 | 3 | 0 |
| 1998 | 1 | 0 |
| 1999 | 6 | 0 |
| 2000 | 6 | 0 |
| 2001 | 16 | 8 |
| 2002 | 22 | 19 |
| 2003 | 19 | 48 |
| 2004 | 27 | 48 |
| 2005 | 35 | 115 |
| 2006 | 82 | 124 |
| 2007 | 71 | 68 |
| 2008 | 63 | 76 |
| 2009 | 42 | 73 |
| 2010 | 62 | 52 |
| 2011 | 42 | 32 |
| 2012 | 31 | 31 |
| 2013 | 41 | 26 |
| 2014 | 38 | 34 |
| 2015 | 34 | 31 |
| 2016 | 34 | 32 |
| 2017 | 34 | 14 |
| 2018 | 17 | 19 |
| 2019 | 28 | 21 |
| 2020 | 23 | 28 |
| 2021 | 20 | 13 |
| 2022 | 13 | 20 |
| 2023 | 10 | 24 |
| 2024 | 20 | 35 |
| 2025 | 20 | 27 |
| 2026 | 11 | 21 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Edge placement with spatial light modulator writing1 Sep 2026US 12,724,352 B2Mycronic AB
- Systems and methods for distributing light delivery28 Jul 2026US 12,693,602 B2ASML Netherlands B. V.
- High accuracy temperature-compensated piezoresistive position sensing system2 Jun 2026US 12,645,069 B2ASML Netherlands B. V.
- Method and system for nanoscale data recording26 May 2026US 12,638,779 B2
- Spatial light modulation unit and exposure apparatus12 May 2026US 12,625,433 B2Nikon Corporation
- Optical apparatus, exposure apparatus and exposure method8 Oct 2026US 2026/0310089 A1SCREEN Holdings Co., Ltd.
- Exposure apparatus and wiring pattern forming method8 Oct 2026US 2026/0310090 A1Nikon Corporation
- Run to run overlay compensation in lithography sequences employing different lithography methods8 Oct 2026US 2026/0310103 A1
- Digital lithography exposure unit boundary smoothing1 Oct 2026US 2026/0299433 A1APPLIED Materials.Inc.
- Pattern generator and method for driving pattern generator24 Sep 2026US 2026/0288013 A1Mycronic AB
Most cited
By later US patents
- Spatial light modulator and method846US 5,061,049 ATexas Instruments Incorporated · 1991
- Method and apparatus for patterning and imaging member753US 5,523,193 ATexas Instruments Incorporated · 1996
- Exposure device including an electrically aligned electronic mask for micropatterning662US 5,229,872 AHughes Aircraft Company · 1993
- Illumination device658US 5,296,891 AFraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. · 1994
- Spatial light modulator and method555US 5,096,279 ATexas Instruments Incorporated · 1992